Used AMAT / APPLIED MATERIALS P5000 #9217907 for sale

Name: AMAT / APPLIED MATERIALS P5000
Brand: AMAT / APPLIED MATERIALS
SKU: 9217907
Availability: SoldOut

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Reactors

Manufacturer

AMAT / APPLIED MATERIALS

Model

P5000

ID: 9217907

Wafer Size: 8"

Vintage: 1996

CVD System, 8" Process: SIO Process chamber: Chamber A & B: SIO Chamber D: ETCH Chamber version: Chamber A & B: VAT ISO Valve Chamber D: Standard RF Generator type: Chamber A & B: OEM-12B Dry pump type: Chamber A, B, D & L/L: EBARA 50x20 UERR 6M-J Throttle valve type: Chamber A, B & D: Non heated VME System: 20 Slots CPU: Synergy Video: VGA SEI AI AO (4) DI/DO (4) Steppers Hard Disk Drive (HDD) Floppy Disk Drive (FDD), 3.5" Manometer type: Chamber A & B: MKS 122B 11441 Chamber D: MKS 127 RF Matching box type: Chamber A & B: 0010-09750D DR Chamber D: 0010-09416 Turbo pump type: Chamber D: LEYBOLD NT340M System electronic type: (2) TC Gauges Buffer I/O AI MUX (2) OPTO (4) Choppers +12VPS +15VPS -15VPS Storage elevator: 8 Slots Cassette handler: Phase III, Top clamp Robot: Phase III Blade: Phase III I/O Wafer sensor Load lock purge Heat exchanger: AMAT0: Connect to chamber A, B & D: Wall / LID Main frame front type: Through-the-wall Standard remote frame TC Gauge type: Chamber-A Rough: VCR Chamber-B Rough: VCR Chamber-D Rough: VCR L/L Rough: VCR L/L Chamber: VCR Lamp module type: Chamber A & B: STD 0010-09337 Mini-con Magnet driver type: Chamber A & B: P/N 0015-09091 Chamber D: P/N: 0015-70060 Signal tower Gas panel type: (28) Gases MFC Type (Main): Chamber / Flow Gas / Flow size / Calibration gas / Maker / Model B / SIH4 / 500 / N2 / STEC / SEC-4400 B / N2 / 5000 / N2 / STEC / SEC-4400 B / CF4 / 5000 / N2 / STEC / SEC-4400 B / N2O / 300 / N2 / STEC / SEC-4400 A / SIH4 / 500 / N2 / STEC / SEC-4400 A / N2 / 5000 / N2 / STEC / SEC-4400 A / CF4 / 5000 / N2 / STEC / SEC-4400 A / N2O / 300 / N2 / STEC / SEC-4400 D / O2/ 100 / N2 / STEC / SEC-4400 D / CF4 / 500 / N2 / STEC / SEC-4400 D / AR / 100 / N2 / STEC / SEC-4400 MFC Type (Remote): Chamber / Flow Gas / Flow size / Calibration gas / Maker / Model A / NF3 / 1000 / N2 / STEC / SEC-4400 A / N2O / 3000 / N2 / STEC / SEC-4400 B / NF3 / 1000 / N2 / STEC / SEC-4400 B / N2O / 3000 / N3 / STEC / SEC-4400 1996 vintage.

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AMAT / APPLIED MATERIALS P5000 is a full-featured automated processing tool designed for high-volume semiconductor manufacturing. It is precision-engineered for superior performance and offers a range of process recipes and configurable capabilities for maximum versatility. AMAT P-5000 provides a powerful processing chamber that can handle a large volume of substrates with higher throughput. It has a five-zone cassette-style loadlock and substrate transfer equipment that ensures stable thermal cycling and repeatable process conditions. The system also offers digital and analog loadlock sensors for monitoring temperature, pressure, and other environment parameters. The reactor has an enhanced automation platform that provides integrated DataBoss and Primus software to simplify programming and equipment management. DataBoss Explorer software provides advanced optics and ergonomic features to quickly configure recipes and optimize process results. Primus software allows users to preset recipes and access multiple process controllers to optimize recipe progression and substrate throughput. APPLIED MATERIALS P 5000 is equipped with a Suite 200 ultra-high-vacuum cluster station that offers rapid cycle times and excellent control accuracy. The unit is also provided with a VacGenEx dual-gun, single-liner deposition capability that provides superior deposition quality and throughput. AMAT / APPLIED MATERIALS P-5000 features a wide range of plasma technologies, including inductively coupled plasma (ICP), radio frequency (RF) bias, microwave plasma, and remote-plasma-source plasma. All of these plasma technologies are designed to increase process flexibility and yield. The machine also has integrated heating and cooling capabilities for precise temperature control. APPLIED MATERIALS P5000 can void process gases for maximum maintenance cost savings and supports up to eight reactors for enhanced throughput capabilities. It is compatible with a variety of substrates and substrates types, including crystalline silicon, GaAs, and glass. AMAT P5000 is equipped with integrated safety features, including Argon gas pressure monitoring, inertial sensors, and anti-static grounding systems. It also comes with advanced reporting and analysis capabilities to empower users to quickly analyze data and identify performance trends that may affect device yields.