Used AMAT / APPLIED MATERIALS P5000 #9226363 for sale

AMAT / APPLIED MATERIALS P5000 is a large area, single wafer power reactor designed for high productivity resistive and capacitive etching applications. It is the first power etcher with a 5-inch wafer capability. The tool features a multi-level bi-directional plasma source, four electrodes with an optional fifth electrode, and an adjustable dual ion-based window. The large area etching chamber allows for up to five wafers in a single batch, providing higher throughput with fewer process cycles. AMAT P-5000 features multiple gas injection ports, allowing more gasses to be injected into the etching chamber, resulting in better etching process consistency and control. The tool also includes a backside cooling assembly that provides uniform cooling for all the wafers in the etching chamber. This helps to ensure that each wafer receives uniform etching and cooling. The tool also offers an integrated process monitoring system with an automatic gas leveling, temperature control, and RF real-time process monitoring system. The integrated power supply controls the power levels in the etching chamber, and the gas flow control monitors gas flow across the wafer. APPLIED MATERIALS P 5000 also has an automatic process tracking system to ensure accurate and repeatable etching results. P 5000 has advanced process control that allows users to customize process parameters to achieve desired product results. This includes the ability to adjust etching current levels, peak power and duration, and adjust the width of the RF pulse, among other parameters. This feature makes the tool particularly suited for advanced manufacturing processes. P-5000 also offers a host of safety features, including an expanded Shielding Cover Tray, metal collision detection, and limited radiation leakage. The tool also automatically detects wafer breakage and other safety alarms. In summary, AMAT / APPLIED MATERIALS P-5000 is a large area, single-wafer power reactor designed for high productivity resistive and capacitive etching applications. It features a multi-level bi-directional plasma source, four electrodes with an optional fifth electrode, and an adjustable dual ion-based window. The tool also includes integrated process monitoring, advanced process control, and a host of safety features, making it an ideal choice for advanced manufacturing processes.