Used AMAT / APPLIED MATERIALS P5000 #9236839 for sale

AMAT / APPLIED MATERIALS P5000 is a high-performance plasma etch process equipment designed for the production of a variety of materials. It is a fully automated reactor that operates in a cleanroom environment. AMAT P-5000 utilizes advanced dual-frequency plasma technology, allowing it to achieve increased process precision and higher than average throughput. This makes it ideal for applications such as semiconductor device production and advanced science processes, such as research and development. APPLIED MATERIALS P 5000 is equipped with a 2700 watt high frequency RF power source, capable of providing high uniformity plasma profiles over the entire working surface. It also contains Dual-Target plasma sources that allow the concentration of etching plasma to be tailored in specific areas of the device, enabling complex shapes and features to be etched. AMAT / APPLIED MATERIALS P 5000 features an open-architecture software suite, as well as a suite of work automation/robotics tools. The overall design of APPLIED MATERIALS P5000 system is based on a modular and scalable framework. This design allows for easy process scalability and high-throughput processing capabilities. The unit also features a variety of environmental controls and support systems, such as temperature, pressure, and vibration management control systems. This helps to ensure reliable, repeatable process results, reducing the possibility of machine downtime and the associated production loss. APPLIED MATERIALS P-5000 has been designed for use in multiple industries, such as advanced packaging, compound semiconductor fabrication, biomedical device fabrication, and MEMS production. It is also used in materials science applications such as surface modifications and etching, allowing the creation of high-precision surface features and patterns with low-damage effects. AMAT P5000 is a high-performance, automated reactor with advanced control capabilities that can be utilized in a wide range of production and research processes. Its modular design allows it to handle complex etch processes, while its high-power RF source and dual-target plasma sources offer superior precision and throughput. With the addition of its unique automation/robotics tool suite and range of environmental control capabilities, P5000 is an ideal choice for any application requiring repeatable and reliable performance.