Used AMAT / APPLIED MATERIALS P5000 #9237058 for sale

AMAT / APPLIED MATERIALS P5000 is a reactor, or deposition chamber, that gives scientists and engineers the capability to precisely manipulate, deposit and grow thin layers of materials onto a variety of substrates in a controlled atmosphere. It is a low-temperature processing tool that utilizes Plasma Enhanced Chemical Vapor Deposition (PECVD) technology, which provides faster deposition rates with greater uniformity and better step coverage - over traditional chemical vapor deposition (CVD) methods. AMAT P-5000 is designed to be an easy to use and efficient system, with a viable range of processes that enable customers to deposit material onto substrates under a variety of conditions, as well as simply cleaning and annealing existing surfaces. The reactor can be used to deposit a variety of materials, including silicon nitride, dielectric oxides, and amorphous carbon, as well as the deposition of silicon, germanium, and other metals. APPLIED MATERIALS P 5000 is composed of several key components that enable it to precisely control and deposit thin layers of material with high accuracy. These components include the vented enclosure and vacuum chamber, the substrate table with holder, the deposition source, and the automated process valve. The enclosure keeps the chamber under a vacuum, allowing for a precise and stable environment for the deposition process to take place. The substrate holder securely holds the substrate in place during process, and the deposition source creates a high energy plasma from the inert gas molecules, which is necessary to deposit the thin layers of material onto the substrate, while the automated process valve can open and close to allow materials to enter, and exhaust gases that are generated during the process. P 5000 is designed to ensure a precise, high quality deposition process, but also be highly efficient. The deposition chamber is outfitted with an efficient heat control system, enabling scientists to minimize thermal loading on the substrate during deposition. Additionally, the system is designed to minimize gas and energy usage, resulting in greater efficiency and cost savings. Overall, APPLIED MATERIALS P5000 is a versatile, efficient, and easy to use deposition chamber that allows scientists and engineers to deposit thin layers of materials onto various substrates with precision and accuracy. Its low-temperature processing capabilities, along with the efficient energy and gas usage features make it a valuable tool for research, development, and manufacturing applications.