Used AMAT / APPLIED MATERIALS P5000 #9238731 for sale

AMAT / APPLIED MATERIALS P5000 is a high-performance, end-user platform for the production of advanced semiconductor materials, including single- and dual-dielectric stacks, strained silicon layers, metal gates, and other advanced device layers. It is an "all-in-one" platform for semiconductor fabrication, designed to provide customers with cost-effective, efficient solutions for the fabrication of complex device structures. In terms of its technical specifications, AMAT P-5000 is a high-temperature, plasma-based batch reactor. It is equipped with an advanced controller board, which enables discrete tuning and provides closed-loop process capability to ensure the highest quality layer formation during deposition. This controller includes an enhanced user interface that provides operators with the necessary tools to modify process parameters quickly and accurately to meet specific device requirements. At the heart of APPLIED MATERIALS P 5000 is a hot-filament source plasma source, which allows for efficient, low-cost deposition of metal layers, up to 9200 angstroms thick. The hot-filament source is capable of producing temperatures up to 1000°C and can be adjusted to produce both monocrystalline or polycrystalline layers. Furthermore, its in-situ feature allows for instantaneous fine tuning and elimination of nucleation sites from the wafer surface. AMAT P5000 also features a cleanroom compatible "air curtain" equipment to ensure a virtually particle-free environment for production. The air curtain features a multi-stage filtration system, designed to reduce contamination and minimize airborne particulate impacts. This unit also helps to reduce particle loading in the processing chamber, as it prevents particles from entering the process environment. AMAT / APPLIED MATERIALS P-5000 is also equipped with a high-level diagnostic machine, which enables operators to closely monitor and detect defects in the deposition process. This tool includes advanced software programs allowing users to set and manage the deposition process quickly and easily. Additionally, P-5000 includes a number of safety features and innovative design enhancements, such as thermal shutoff valves, internal seals and pressure sensors, to ensure the highest level of operator safety and protocol. In conclusion, P 5000 is a powerful, reliable, and highly efficient reactor, designed specifically to meet the demands of modern semiconductor fabrication. Its advanced controller board and cleanroom compatible air curtain asset ensure a virtually particle-free environment, with accurate, repeatable process states that can be closely monitored and tuned quickly and accurately. AMAT P 5000 is an excellent choice for those seeking to produce complex device structures in a cost-effective and efficient manner.