Used AMAT / APPLIED MATERIALS P5000 #9243884 for sale

AMAT / APPLIED MATERIALS P5000 is an advanced etch reactor designed to provide ultra-high-rate etching performance for semiconductor manufacturing processes. AMAT P-5000 operates at temperatures between -25°C and 500°C, and features an advanced, high-efficiency plasma source for enhanced etch rates and improved etch uniformity. APPLIED MATERIALS P 5000 employs a dual chamber design, consisting of an upper and lower chamber that can be easily reconfigured for different etching processes. The upper chamber contains the plasma source, while the lower chamber holds the etch gas and vacuum components. The modular design allows AMAT / APPLIED MATERIALS P-5000 equipment to be easily tailored to specific process requirements. AMAT P5000's advanced plasma source utilizes a high-power RF generator and a robust magnetron to generate an intense etch plasma within the processing chamber. The plasma is produced at high density (up to 3 Watts/cm2) and is used to etch away materials with precision accuracy without compromising the integrity of surrounding circuitry. P 5000 also features a patented, dual ionizer design for improved process yields. The dual ionizer system uses two separate high frequency RF generators to create a powerful and uniform ion energy distribution throughout the processing chamber, allowing for improved etch uniformity. APPLIED MATERIALS P-5000 is designed to run multiple wafer sizes and substrate materials, including low thermal budget devices. For superior safety and convenience, the unit features an integrated temperature maintenance machine, automatic RF power regulation, and a reliable high-efficiency dry pumps. For maximum flexibility, APPLIED MATERIALS P5000 is available with a wide range of accessories, such as RF match networks, exhaust pumps, cable kits and control packages. The tool is also compatible with multiple monitoring and control systems, including AMAT Pro E-200 Controller. AMAT / APPLIED MATERIALS P 5000 is an advanced etch reactor that helps semiconductor manufacturers etch materials with precision accuracy in ultra-high-rate processing speeds. The asset utilizes a dual chamber design and a high-efficiency magnetron to generate a powerful, uniform plasma inside the chamber. P5000 is compatible with multiple wafer and substrate sizes, and offers users maximum flexibility with a wide range of accessories and control systems.