Used AMAT / APPLIED MATERIALS P5000 #9245114 for sale
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ID: 9245114
Wafer Size: 8"
Vintage: 1994
PECVD System, 8"
With (2) process chambers
1994 vintage.
AMAT (APPLIED MATERIALS) AMAT / APPLIED MATERIALS P5000 is a horizontal, single wafer reactor that is typically used to process materials such as silicon and gallium arsenide used in the fabrication of semiconductor devices. It is a high-precision tool that is designed to provide the accuracy and repeatability necessary when working with the sensitive material used in semiconductor device production. AMAT P-5000 features a range of features and capabilities that can be used to customize the reaction chamber to meet the specific needs of the user. APPLIED MATERIALS P 5000 is powered by AMAT / APPLIED MATERIALS Endura Electronics controls and has an active chamber size of 8 x 8 inches (20.6 x 20.6 cm) and can operate with pressures ranging from 29hPa to 700hPa (0.1 to 5 torr). In addition, P 5000 can be paired with a range of different reactive gases and supports a variety of temperature control methods, including resistance heating and thermal coolers. The maximum ramp rate on APPLIED MATERIALS P-5000 is greater than 600ºC per minute and its set-point accuracy is greater than 0.1ºC. The internal walls of the chamber feature Dynamically Indicative Stress Isolation Technology (DIST) that is designed to maintain a consistent temperature profile, ensuring that the samples are not exposed to any significant thermal gradients. AMAT / APPLIED MATERIALS P-5000 features a full range of monitoring and control features, including process monitoring, vacuum chamber, pressure and flow control, temperature control, and data logging. APPLIED MATERIALS P5000 is designed to integrate seamlessly with other AMAT processing systems, including their Endura and Centura tool systems, as well as the waferware automation software. This allows for a variety of levels of automation and provides the user with an efficient and cost-effective way of achieving their desired results. Overall, AMAT P 5000 is a high-precision reactor that is designed to offer the accuracy and repeatability required for the sensitive semiconductor devices.
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