Used AMAT / APPLIED MATERIALS P5000 #9248604 for sale

AMAT / APPLIED MATERIALS P5000
ID: 9248604
Wafer Size: 8"
Vintage: 2000
PECVD System, 8" (2) Chambers No gas panel 2000 vintage.
AMAT / APPLIED MATERIALS P5000 is a production-capable, wafer-scale chamber-based reactor ideal for semiconductor device fabrication. This reactor enables the formation of high-quality interfaces for a variety of integrated circuit (IC) applications. It offers an unparalleled level of processes, scalability, and ease of integration for the semiconductor device manufacturer. AMAT P-5000 reactor features a low-temperature plasma enhancement chamber (PEEC) and utilizes advanced etching and deposition processes. The PEEC features a 650 mm process chamber with a dual-sided glow discharge equipment and integrated wafer handling. The wafer-handling system automates loading, unloading, and transitional operations of the chamber, providing a versatile etching and deposition platform. APPLIED MATERIALS P 5000 also offers a high-fidelity, versatile etching process, allowing device manufacturers to create various integrated circuit designs quickly and efficiently. The reactor can provide high-quality interfaces for high-performance, high-voltage and high-frequency devices; as well as optical and non-volatile memory design with excellent uniformity and morphology. The reactor also features a dual-frequency power supply unit, which offers the ability to select a frequency between 20-120 kHz, allowing for precise control of the process. This enables device manufacturers to achieve tight control over process parameters, and to output exceptional quality integrated circuits. In addition to the etching and deposition processes, P5000 reactor offers advanced monitoring and control features, enabling device manufacturers to easily adjust and monitor process parameters such as pressure, temperature, and power level. Overall, P 5000 is a highly capable and customizable wafer-scale reactor, ideal for semiconductor device fabrication. With its versatile etching and deposition processes, monitored and controlled process parameters, and advanced wafer-handling machine, AMAT P 5000 is the ideal reaction for device manufacturers who require a production-capable, production-scale solution for their integrated circuit application.
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