Used AMAT / APPLIED MATERIALS P5000 #9248920 for sale

AMAT / APPLIED MATERIALS P5000 reactor is a plasma enhanced chemical vapor deposition (PECVD) reactor designed for epitaxial growth of electronic and optoelectronic applications. It offers high-rate deposition of high quality epitaxial layers of multiple materials on a wide range of substrates. The reactor has a 150mm parallel plate equipment, which is scalable to other sizes. AMAT P-5000 reactor features four distinct process plasmas: inductively coupled plasma (ICP), direct current (DC) or pulsed DC (PDC) source. It is capable of sustaining plasmas in a range between 10-100 millitorr. It has been optimized for low-power, high-efficiency processes and offers a wide range of process pressures and deposition rates for high-rate epitaxy. APPLIED MATERIALS P 5000 system includes advanced gas delivery modules and a flexible inter-reactor chamber. The unit is also equipped with a variety of diagnostic tools such as real-time chamber pressure monitoring; in-situ and real-time deposition rate monitoring; variable source power; substrate temperature control with cooling capability; automated endpoint detection; and integrated multi-wavelength spectroscopy. All diagnostic tools are designed to reduce process time by optimizing the process based on real-time control. AMAT P 5000 machine also offers superb temperature uniformity profile across the substrate area. This allows for homogeneous thin-film layer deposition and better yields. The reactor is optimized for use with ammonia-based processes as well as other chemistries. The tool is designed for ease of use and high-throughput operations. It is easy to set up and calibrate, with automated diagnostics and recipes that allow users to rapidly select processes and adjustable parameters. P5000 asset is set up for compatibility with model-based control software and data-visualizer software. In conclusion, AMAT / APPLIED MATERIALS P-5000 reactor is an advanced PECVD model that has been optimized for low-power, high-efficiency processes. It is suitable for various applications, all with the assurance of high-quality thin-film deposition, uniformity, and reliability. It is also easy to set up and calibrate, along with other advanced programming options for maximum precision.