Used AMAT / APPLIED MATERIALS P5000 #9249468 for sale
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ID: 9249468
CVD System, 6"
Install type: DLH
Wafer shape: Lamp heated
EMO Type: Turn to release
Gas panel: (3) Chambers
Clean system: RF Clean
AC Rack
Generator rack
Monitor rack
Heat exchanger
(3) Chamber type:
Chamber A: DLH SA Chamber
Chamber B: DLH SA Chamber
Chamber D: DLH SA Chamber
Loadlock: 8 Slots
Cassette, 6"
Vent type: Variable speed
Mainframe:
Buffer robot type: P5000
Buffer robot blade: Blade
Status light tower
Remote monitor: Table mount
Sub-system:
AMAT-0 Chiller
(3) ADTEC AX-1000AM II RF Generators
Electrical configuration:
Line voltage: 208 V
Full load current: 180 A
Frequency: 50/60 Hz
CE Marked
1996 vintage.
AMAT / APPLIED MATERIALS P5000 is a thermal processing chamber specifically designed to provide uniform and repeatable processing results. This reactor is an ideal solution for a wide range of vacuum-based processes that require homogenous temperature and atmosphere control. AMAT P-5000 is equipped with an advanced dual-chamber design, featuring two separate compartments that can be used simultaneously. The integrated wafer transport equipment provides easy manipulation and controlled movement of diverse sample sizes. The system also incorporates two main controllers - the main control and the load lock controller - that can be used in different configurations. APPLIED MATERIALS P 5000 unit offers a range of dynamic control capabilities, allowing users to accurately fine-tune their processes to achieve the desired performance results. The machine is powered by a self-purging, thin-film ringed heating element that ensures evenly distributed temperatures between 10°C and 800°C. Additionally, the tool is equipped with a powerful air-fed cryopump which ensures rapid vacuum operation. Furthermore, a robust water-cooled blower ensures fully contained and distortion-free processing, providing high-precision results. The versatile P-5000 reactor is also equipped with an adjustable high-performance lid that enables easy access to sample carousels. The lid holds four different carousels within the two-chamber configuration, providing ample sample capacity. Advanced flexibility allows users to install a wide range of wafer sizes and shapes, including round, square, and rectangular. P5000 reactor is equipped with multiple safety features, which is vital when dealing with hazardous materials. The industrial-grade chamber seal asset provides critical protection against chemical exposure and potential accidents, while the integrated emergency stop model prevents loss of operational control. P 5000 also boasts multiple software-driven features, including advanced data logging capabilities and Ethernet connectivity. This equipment provides easy and secure online access to data export and import and enables advanced integration into existing factory networks for simplified process monitoring, automated data acquisition, and more. Overall, AMAT P5000 is an advanced thermal processing chamber specifically designed to offer advanced uniformity, repeatability, flexibility, and security during a wide range of high-precision vacuum processes.
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