Used AMAT / APPLIED MATERIALS P5000 #9255615 for sale

AMAT / APPLIED MATERIALS P5000 Ion Implanter is a high-current implanter capable of high-throughput implantation of wide-ranging dopant species into large substrates. It is engineered with a 4-Megawatt amplifier and is capable of generating Implant Gun frequencies from 1000 Hz to 10 kHz, providing a dose uniformity of +/− 0.5%. This enables the production of highly uniform dopants without spatial variations. AMAT P-5000 has exceptional implant capability for semiconductor processes including source/drain, gate and silicide. Its improved beam management provides substrate-like precision of the ion-beams, resulting in minimal sputtering, improved process control and higher throughput. APPLIED MATERIALS P 5000 utilizes a gun that is large enough to inject semi-transparent substrates of up to 8" wide. It features a 4-million-volt amplifier that can be used to supply up to 2000 amperes to power the gun. This integration of the neutralized ion beam with tremendous beam current minimizes beam size, rim effects and uniformity. The integrated plasma source also optimizes the implant of new materials including SiGe, III-V compounds, etc. AMAT P5000ion implanter is one of the most efficient tools for semiconductor and MEMS processing. This implanter is designed for use in a high-throughput production environment where uniformity and accuracy are of the utmost importance. It is capable of emitting beams which can be easily adjusted for a wide variety of applications. Its integrated plasma source and 4-Megawatt amplifier give it the ability to affect material with a wide variety of dopant species in a uniform manner. Furthermore, its high-throughput capability, increased energy flexibility, improved beam management and beam size control, make it an ideal tool for chip fabrication.