Used AMAT / APPLIED MATERIALS P5000 #9255616 for sale

AMAT / APPLIED MATERIALS P5000 is a type of reactor designed to process liquid materials in a high-temperature environment. It is commonly used to deposit thin films of different materials, such as metal, diamond-like carbon, and boron. It is particularly useful for process control in chemical vapor deposition (CVD) applications. AMAT P-5000 is a vertical-load, thermal chemical vapor deposition (CVD) reactor, meaning that it is capable of both thermal chemical deposition and cold wall processes. It is a PECVD (plasma-enhanced CVD) chamber, which has the ability to deposit very thin layers of materials on the target substrate. It features a large, spherical chamber with a process window, which allows the target substrate to be exposed to various gases in a controlled environment. APPLIED MATERIALS P 5000 is also highly reliable and efficient, making it a great choice for CVD applications. The reactor is powered by a 30 KW RF (Radio Frequency) generator. It features an advanced, energy efficient heating element and dual thermocouples for temperature monitoring and control. The main processing chamber has adjustable RF power options or two distinct analog outputs to vary the process gas pressure and ratios. P 5000 is also equipped with a number of user-friendly features, such as a digital timer, manual start/stop function, and programmable timer. AMAT / APPLIED MATERIALS P 5000 reactor is capable of operating at temperatures up to 1000°C and pressures as low as 100 Torr. It is also equipped with a sample loading system, which automatically loads up to 8 samples. There is also a built-in positioner that allows the sample to be moved according to process recipes. P-5000 is capable of producing high-quality thin films, with good uniformity, high deposition rates, low particle emissions, and excellent surface and structural properties. In conclusion, APPLIED MATERIALS P5000 is a powerful and reliable CVD reactor. It is highly efficient, featuring an adjustable RF power source, advanced heating element, dual thermocouples, sample loading systems, and programmable timer. It is ideal for thin film applications, providing optimal thin film quality and excellent process control.