Used AMAT / APPLIED MATERIALS P5000 #9255617 for sale

AMAT / APPLIED MATERIALS P5000 reactor is a high-output process tool used to create integrated circuits from pre-sized semiconductor wafers. This reactor is part of the company's Substrates Solutions (ASL) line of products and presents a cost-effective, high-performance equipment for the deposition of materials, such as metals, interconnects, dielectric and semiconductor films. AMAT P-5000 reactor is AMAT most advanced process tool. Its primary manufacturer target is the semiconductor industry, which requires tools that can deliver high performance, throughput, and accuracy. Compared to other APPLIED MATERIALS processes, APPLIED MATERIALS P 5000 reactor is designed to have higher throughput and improved productivity. The reactor can support a wide range of process times, chamber pressures, and process temperatures. It has a maximum process rate of up to 2 Mbps, an integrated pressure control system, and an advanced thermal management unit. The unique removable chamber design provides easy accessibility to the process chamber for easy maintenance and cleaning. AMAT P5000 reactor's advanced process technology includes improved film uniformity, excellent substrate adhesion, reduced pull-off values and lower stress levels. Its built-in metrology machine allows in-situ monitoring of deposition parameters as well as process performance. This helps to ensure that processes are running as intended and product quality is maintained. The device supports a variety of technologies and processes, including ALD, CVD, PECVD, atmospheric-pressure CVD, rapid thermal processing, and physical vapor deposition. To ensure optimal performance and process stability, the reactor can be equipped with AMAT / APPLIED MATERIALS Sub-Ambient Processing and Sub-Ambient Temperature Control technology. AMAT / APPLIED MATERIALS P 5000 reactor is designed to meet the stringent requirements of the semiconductor industry. It is equipped with uninterruptible tool power and load ports, allowing for speedy production of devices with minimal downtime. The chamber can also be cooled to temperatures lower than -140°C for extra process stability. Overall, AMAT / APPLIED MATERIALS P-5000 reactor is an advanced, sophisticated process tool. It provides a reliable, accurate and high-output solution for creating integrated circuits from pre-sized semiconductor wafers, making it an essential device for any semiconductor fabrication facility.