Used AMAT / APPLIED MATERIALS P5000 #9255618 for sale

AMAT / APPLIED MATERIALS P5000 is a multi-chamber, multi-stage vacuum process equipment designed for ultra-high-performance semiconductor applications such as advanced device structures and advanced packaging. AMAT P-5000 is a multi-chamber system designed to precisely control temperatures and gases in the range of vacuum process steps required for these applications. It features an eight-chamber design with main chamber, shield chamber and process chamber and four pre-clean chambers. The main chamber has a baseplate with pre-installed reactive process tubes, while the shield chamber is equipped with a higher-temperature furnace to provide additional thermal protection during the process. The process chamber includes three sources of deposition equipment: a microwave source; an electron-cyclotron resonance source; and a drift chamber source. The unit includes advanced process intelligence and integrated control systems as well as various safety and monitoring systems. The process intelligence software is used to allow automated initiations of optimized process recipes, while the integrated process and safety monitoring systems help maintain maximum efficiency and performance. Furthermore, the machine features a touch screen interface that allows for the monitoring and control of power levels, plasma parameters, temperatures and other requirements needed for the process. The tool is engineered to handle decoupled processes for sub-Ånm production, as well as processes involving highly trenched wafers with features below 50nm. It is designed to run complex dual composition and dual layer deposition combinations as well as sequential etch and deposition steps at ultra-low temperature without recirculating processes over multiple stages. In addition to the above features, APPLIED MATERIALS P 5000 utilizes several innovative technologies such as a proprietary RF source excitation, an advanced ion beam source, advanced chamber geometry and motion optics. These technologies allow for the achievement of high speed and uniformity of coating and patterning. P-5000 also offers a dual-level facility layout to enable excellent accessibility and maintenance. Overall, APPLIED MATERIALS P-5000 is a multi-chamber, multi-stage vacuum process asset specially designed for ultra-high-performance semiconductor applications. It featuers advanced process intelligence and integrated control systems, various safety and monitoring systems, and an innovative dual-level facility layout. With its advanced technology, the model is able to provide amazing speeds and uniformity for coating and patterning of highly advanced semiconductor production applications.