Used AMAT / APPLIED MATERIALS P5000 #9255619 for sale

AMAT / APPLIED MATERIALS P5000 reactor is a highly advanced in-situ Deep Reactive Ion Etching (DRIE) tool used for the production of very small, complexly-shaped holes and microstructures in a variety of materials. The DRIE process in AMAT P-5000 is highly efficient, with etch rates of greater than 100 μm/min achievable in most materials and processes. In addition, it is also capable of etching a variety of non-conductive materials with a minimum of vacuum breakage, allowing for a wide range of manufacturing options and applications. APPLIED MATERIALS P 5000 features a trench-filled, annular discharge source, which is an improvement over conventional magnetron sources. This results in greater uniformity and a more homogeneous plasma desired for the etching process. Additionally, APPLIED MATERIALS P-5000 is an multi-chamber equipment with a quartz processing chamber and a supporting chamber occupying separate chambers. This separation of chamber functions allows for a more efficient manufacturing process because it allows for more intricate processes and more precise etching to take place without taking up either processing or support chamber space. AMAT / APPLIED MATERIALS P 5000 uses multi-level susceptor technology, which ensures precise control over both the etching and the substrate environment in real time, while eliminating damage to the substrate due to thermal processing. Also, the All-Metal Substrate Fastening System allows for precise and efficient positioning of the substrate, leading to higher yields and better etch resolution. Furthermore, the closed loop cooling/heating unit in P-5000 ensures temperature consistency throughout the etching process. P5000 is capable of etching a variety of materials, ranging from metals to dielectrics, including III-V's, and is fully automated; making P 5000 a must-have tool in the automated manufacturing environment. Additionally, AMAT P5000's advanced control scheme provides precise etch rate control, making it easy to modify etching rates without having to reposition the susceptor in order to change the etch setup. Overall, APPLIED MATERIALS P5000 is an all-in-one, highly advanced deep reactive ion etching reactor. Its advanced annular discharge source, multi-level susceptor technology, and multi-chamber design makes AMAT / APPLIED MATERIALS P-5000 an ideal etching machine for a wide range of materials such as metals, dielectrics, and III-V's. Its precise etch rate control, efficient substrate positioning and temperature consistency, as well as its automated operations, make AMAT P 5000 a must-have tool in any automated manufacturing environment.