Used AMAT / APPLIED MATERIALS P5000 #9262476 for sale

AMAT / APPLIED MATERIALS P5000 reactor is a multi-chamber equipment designed to produce a large range of complex etch and deposition tasks. It is based on the concept of PECVD (Plasma Enhanced Chemical Vapor Deposition) and has been engineered to provide excellent control and precision during plasma etch and deposition processes. AMAT P-5000 specifically features two chamber units, two conventional deposition sources and one RF-biased etch chamber. The two chamber units enable versatile processing, while each chamber can be configured individually to meet a wide range of production requirements. In each chamber unit, one PECVD source is surrounded by two conventional deposition sources. The plasma-enhanced PECVD source is used as the core of the reactor and is designed to offer excellent process flexibility and control. It can be used for selective processes, for movies or for precise patterning. The two conventional deposition sources offer standard deposition processes, such as thermal reactions and evaporation. In addition, the system is equipped with an advanced etch chamber, a proprietary RF-biased unit that is designed to offer improved etch performance. APPLIED MATERIALS P 5000 combines advanced process control with robust mechanical layout, offering excellent precision and repeatability as well as high throughput rates. Using the latest plasma etch and deposition processes, the unit can be used to produce a variety of components and substrates with superior uniformity and quality assurance. The platform is also compatible with a wide range of materials, including Si, GaN, AlN, Mo, Ta and several other materials. AMAT P 5000 reactor is an excellent choice for customers looking to produce superior quality etch and deposition components in a robust and highly flexible machine. With its advanced control and reliable mechanical layout, the tool is capable of producing excellent etch and deposition results with quick turnaround times and cost-effectiveness.