Used AMAT / APPLIED MATERIALS P5000 #9266344 for sale
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ID: 9266344
Wafer Size: 8"
Vintage: 1999
System, 8"
System skins: Side skins
No helium cooling system
RF Cable position interlock (Match box): OEM-12B
RF-On indicator
Mounting: Lamp mounted on remote AC box
Minicontroller
Heat exchangers: AMAT-0
No heat exchanger skins
No chiller
No H2O flow switch
No EMO guard ring
Mainframe:
Loadlock / Cassette options:
Tilt-out cassette loader
Elevator type: 15-Slots
No load lock lid lifter
Robot
Wafer position sensor
Umbilicals:
Remote signal cable lengths: 50 ft
RF Generator coax cable length: 50 ft
Smart pump interface cable length: 50 ft
Leak check ports
Minicontroller: 10 ft
No status light tower
Signal status indicator: Mainframe
No manual
Missing parts:
SEI Board
VGA Board
Stepper control board
(3) DI/O Boards
Hard Disk Drive (HDD)
Chamber B: Baratron gauge (10torr)
Monitor
Main to AC box power cable
Frequency: 50 Hz
1999 vintage.
AMAT / APPLIED MATERIALS P5000 is a reactor used for high-density plasma etching and deposition. It is designed to deliver precise high-density plasma etching, high-throughput and uniformity of wafer processing with very low power consumption. It features a high-pressure, high-vacuum chamber, which has a more efficient transfer of high-density plasma and better uniformity due to increased gas flow and better electron-cloud densities. It is capable of generating plasma over a wide range of pressures and temperatures, which enables precise and control of the etching process for improved surface quality and higher yields. AMAT P-5000 reactor is composed of a series of components, which include an automated gas blending equipment, an inductively coupled plasma source, an ion source, ion sources, and a high voltage generator. The automated gas blending system allows for precise and accurate control over the plasma parameters such as pressure, temperature and concentration. The inductively coupled plasma source provides the high-density plasma for etching, while the ion sources are used to control the energy of the plasma. Furthermore, the high voltage generator is used to deliver precise energy levels for consistent results. In terms of its architecture, APPLIED MATERIALS P 5000 reactor features a closed loop gas control unit, designed to maximize performance and reduce contamination levels. It features multiple independent mass flow controllers, temperature stability, sensor feedback and closed-loop gas control to ensure accurate gas delivery and uniform etching over a wide range of substrate sizes. P5000 reactor also features multiple layers of containment technology such as a negative pressure containment machine and a vacuum seal tool, to minimize any contamination. Additionally, AMAT P 5000 reactor includes a unique material-handling asset which works in tandem with the precision etching model to ensure precise and repeatable results. Overall P 5000 is a high-performance, cost-effective reactor for precise, precise etching process with excellent uniformity and yield results. With its advanced features and automated control systems, APPLIED MATERIALS P-5000 is an ideal solution for a wide range of advanced high-density plasma etching applications.
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