Used AMAT / APPLIED MATERIALS P5000 #9267090 for sale

AMAT / APPLIED MATERIALS P5000 is a next-generation, full-capability plasma-assisted chemical vapor deposition (PECVD) process reactor designed to enable high-performance etch, deposition, and anneal processes for advanced semiconductor device geometries and materials. AMAT P-5000 uses state-of-the-art Dual-Source PlasmaTM technology that creates a tightly coupled, dual-frequency source to enable precise control of plasma parameters for maximum process flexibility and efficiency. APPLIED MATERIALS P 5000 incorporates the latest in plasma-assisted reaction chamber technology, providing improved speed, uniformity, and control of the process materials. P-5000 equipment includes automated wafer handling capability, an in situ endpoint detection system, and gas-mixing capability that allows compositionally specific PECVD processes. P5000 offers high-performance, cost-effective processing with low gas consumption, allowing customers to reduce operating costs while still achieving desired deposition rates. It features an integrated, rigorously-characterized plasma source that is capable of both chlorides and fluorocarbons. The integrated wafer handle with contactless chuck provides uniform dispersion of reactants and wafer substrates, regulating the p-type process. The user-friendly touchscreen interface provides clear guidance for unit operations, including configuring the process parameters and optimally controlling AMAT P5000 deposition process. AMAT / APPLIED MATERIALS P-5000 reactor is designed for flexible operation and reliability, with advanced safety features including vacuum and leak protection, internal pressure breaking machine, and an overcurrent-protected RF generator. It also provides high-precision deposition uniformity for a variety of low dielectric constant (low-k) materials, as well as reflow of strained-SiGe. The tool incorporates automatic endpoint detection to reduce defectivity and provide reliable results, while the gas mixing asset enables customers to use a variety of process gases to achieve optimally in situ PECVD processes. APPLIED MATERIALS P5000 is a powerful tool for advanced semiconductor applications, delivering high-performance deposition that meets the stringent requirements of today's electronics, with the flexibility and reliability to adapt to future demands.