Used AMAT / APPLIED MATERIALS P5000 #9267680 for sale

AMAT / APPLIED MATERIALS P5000 is an advanced Chemical Vapor Deposition (CVD) reactor designed for processing a wide range of materials in the semiconductor and electronic industry. It is a single-wafer, linear-driven, inductively-coupled-plasma reactor with a large chamber and a wide process window. AMAT P-5000 is designed with an In-Situ Process Monitoring, a patented Drilling Verification Equipment, and an advanced gas delivery system for precise, real time process control with fast response time. This enables repeatable and reliable processing with excellent uniformity and a high throughput, as well as tight process control. APPLIED MATERIALS P 5000 has a chamber size of 375mm and can accommodate up to 300mm wafers. It is optimized to process high aspect ratios and 3D structures. The patented linear "X-Drive" enables P 5000 to provide 0.1 µm plasma control and full wafer wiggling to improve the uniformity on the wafer surface. It is equipped with an advanced fan control unit to optimize the deposition uniformity. In addition to its high performance, P-5000 reactor is designed for long life-cycle and optimized for low cost of ownership. It is robustly built with low vibration components, high insulation and low-particle count materials. AMAT P 5000 is also equipped with an optimized engineered systems for easy maintenance, avoiding the need for pricey service contracts. APPLIED MATERIALS P-5000 features a fully integrated process controller and diagnostic machine for full integration with the production line for real-time process monitoring and product traceability. It can communicate with nearly all kinds of industry-standard recipe and database systems, including Factory Talk Production Centeral, Solectron's WATRM and Applied's proprietary CMP Lite. It also provides a multi-stage production process optimization to improve yields and cycle times. AMAT P5000 supports a wide range of materials, including oxide, nitride, metal, diamond-like carbon, and organic films. The reactor is especially well-suited for advanced interconnects, high-k memory and logic, MEMS and sensors, III-V opto-electronic devices and OLED displays. APPLIED MATERIALS P5000 also provides excellent step coverage and long deposition lifetimes for 3D application and memory devices. P5000 is an advanced CVD tool that is well-suited for semiconductor, electronic and industrial processes. It provides breakthrough performance with robust linear drive, full wafer wiggling and precise process control. The reactor is designed for precise, repeatable depositions with excellent uniformity, high throughput, and long service life.