Used AMAT / APPLIED MATERIALS P5000 #9279196 for sale

AMAT / APPLIED MATERIALS P5000 is a low-pressure, high-density plasma enhanced chemical vapor deposition (PECVD) reactor. It enables the deposition of various thin film materials on substrates for use in a variety of electronic and photovoltaic applications. The unit is capable of running at low pressures and high temperatures, providing excellent step coverage and uniformity for different thin film coating processes. AMAT P-5000 has a pressure rating of 500 mtorr and operates from a wide range of temperatures from room temperature up to 500°C. The unit is engineered with a fully integrated, heavy duty, vacuum base with a simple bell-jar structure, which provides an optimal flow-through vacuum and feature-specific production flexibility. The reactor is also outfitted with a sophisticated safety equipment that ensures all safety parameters are within specified limits. APPLIED MATERIALS P 5000 is a versatile production line tool that features a built-in controller system with a graphical interface that aligns perfectly with the user's needs. The controller unit is capable of remote interlock control and monitoring, as well as alarm notification functions. The unit has an automated substrate transfer option with semi-automated pre-load and unload stations. The automated substrate transfer in this PECVD machine helps to increase throughput and reduce deposition time for various processes. AMAT P5000 has a premium design and a robust build quality. It has a wide variety of well-built and reliable components that are easy to maintain and are highly energy efficient. The entire unit is compact, modular and has been designed with an economic footprint to deliver the most efficient throughput. It also has integrated factory-replaced components to ensure periodic maintenance and functionality. P5000 is developed to make thin film precursors of superior quality and at a much more optimized price-to-performance ratio. It can also be utilized for glass surfaces, offering superior thermal stability and excellent optical transparency. It has a wide range of features that make it an ideal choice for a variety of thin film applications.