Used AMAT / APPLIED MATERIALS P5000 #9280086 for sale
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ID: 9280086
Wafer Size: 8"
Etcher, 8"
Chamber A and B: MxP Metal
Chamber D: Strip
Mark II Mainframe
29 Slots storage elevator
Helium cooling
Expanded VME
Robot: Phase III
Cassette: Phase II
AC Remote frame
Cables: Digital and analog
Emergency interlock cables
Heat exchanger: AMAT 0
RF Generators: ENI 12A and 12B
ASTEX Microwave
Options: (2) ALCATEL Dry pumps and booster pump.
AMAT / APPLIED MATERIALS P5000 is a highly reliable and efficient plasma-based semiconductor reactor. It is built using several advanced features to ensure efficient performance and maximize productivity. AMAT P-5000 is a single-chamber radial-flow plasma reactor, designed for maximum scalability and multi-zone flexibility. The initial source gas configuration for APPLIED MATERIALS P 5000 includes Ar-Cl2, with the ability to create up to five different source gases from that single combination. This variable source is useful for applications such as polysilicon deposition, gate oxide formation, and poly-Si gate silicidation. The five-zone adjustable process parameters allow for precise control over etch and deposition processes. Meanwhile, the dielectric walls and longLife encapsulated electrodes help reduce particle contamination and maintain process uniformity. AMAT P 5000 includes a plasma source generator with the ability to generate highly uniform plasma over a wide frequency range. The reactor's robust power delivery and control capabilities ensure reliable performance process yields. AMAT / APPLIED MATERIALS P 5000 features automatic load/unload capabilities, accommodating up to 16 200mm wafers or 13 300mm wafers. Temperature uniformity is guaranteed by the generator's integrated cooling module. In addition to its advanced features, AMAT P5000 also includes several safety features. The FM O2 monitor automatically shuts off the gas supply when oxygen levels exceed preset limits to avoid potential hazards. Furthermore, the airlock prevents contact between the operator and the operating environment by automatically closing the chamber doors when it detects unauthorized access. Overall, P-5000 Plasma Reactor is an excellent choice for semiconductor manufacturing. It offers superior performance, scalability, and safety for high-end etch and deposition processes. With its powerful and efficient design, APPLIED MATERIALS P5000 is an ideal choice for any facility looking for reliable and cost-effective results.
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