Used AMAT / APPLIED MATERIALS P5000 #9284522 for sale

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ID: 9284522
Vintage: 1995
CVD System Process: Depo rate Oxide: 6000 A/min Uniformity: 5% (12) Gases: Gas no / Sccm / Gas 1 / 200 sccm / Sih4 2 / 100 sccm / NH3 3 / 3000 sccm / N2 4 / 2000 sccm / N20 5 / 2000 sccm / CF4 / SF6 7 / 200 sccm / Sih4 8 / 100 sccm / NH3 9 / 3000 sccm / N2 10 / 2000 sccm / N2O 11 / 2000 sccm / CF4 / SF6 AC Power Mainframe configuration: Mark Ⅱ, 6" I/O Wafer sensor (21) VME Slots Phase 3 Robot Phase 3 Cassette handler (8) Slots storage elevator Viton O-ring Clean gas box Pressure control system Throttle valve Isolation valve open / Close type Temp control: Lamp heated Vacuum system Chamber: EDWARDS QDP80+QMB500 Pump Load lock chamber: ADP80 Nitrogen Compressed air: CDA / N2 Exhaust Fuse: AC/DC Power box RF Power supply: 1.2 kw and 13.56 MHz Power supply: 208 V, 200 A, AC Input, 3 Phase, 5 Wires 1995 vintage.
AMAT / APPLIED MATERIALS P5000 Reactor is a state-of-the-art equipment used for comprehensive thin film deposition processes. AMAT P-5000 utilizes physical vapor deposition (PVD) technology, making it ideal for high-quality conformal coating and hard-coating requirements for a variety of substrates. APPLIED MATERIALS P 5000 is equipped with two power supplies, enabling independent pulse control and an integrated gate valve which offers superior temperature uniformity. AMAT P 5000 can also be equipped with a built-in high-voltage generator, allowing the deposition process to be tailored-made to specific applications. Additionally, P-5000 can be integrated with expansion chambers, inlet pumps, vacuum pumps, load locks and a poppet valve, ensuring a high quality thin film deposition with superior process reproducibility. AMAT P5000 Reactor is equipped with an easy-to-operate user-friendly control interface and advanced safety protocols. Additionally, AMAT / APPLIED MATERIALS P 5000 offers advanced process control features, enabling complete process parameters setting with robust automation. APPLIED MATERIALS P-5000 reactor can accommodate substrates up to 450mm, providing superior uniformity and deposition rate over wide areas. P5000 is equipped with a unique chambers design allowing it to process substrates of all sizes and shapes. AMAT / APPLIED MATERIALS P-5000 Reactor is a valuable technology for the fast and economical production of complex thin films with superior quality and process repeatability. The reactor is a perfect tool for many industries requiring improved performance, increased safety and enhanced control. By doing away with traditional deposition processes and introducing an automated, highly uniform, fast and reliable deposition process, P 5000 provides superior film uniformity, adhesion and smooth coverage on a variety of substrates. This makes it one of the most reliable and trusted technologies for coating a wide range of substrates.
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