Used AMAT / APPLIED MATERIALS P5000 #9288566 for sale

AMAT / APPLIED MATERIALS P5000 reactor is a versatile, high-temperature process chamber used for a range of semiconductor applications. This is a continuous-flow, high-temperature unit that is utilized to create a variety of arrays using various materials, including silicon, gallium arsenide, copper, and germanium. AMAT P-5000 consists of a body, a multi zone cylindrical chamber, four transport modules, and a reaction module. The body comprises a stainless steel vessel and a temperature control system. The temperature control system is a combined convective-radiative system that heats the chamber and its contents to the desired process temperature. At the opposite end to the process chamber is a gas entry port that feeds in Argon and other process gasses. It also contains a reaction vessel, a furnace, and a set of drive motors for automation. The multi-zone cylindrical chamber is the heart of APPLIED MATERIALS P 5000, where the plasma-enhanced processes take place. It consists of the Source Zone, the Ultimate Method (UMM) zone, and the Reaction Zone. The Source Zone provides RF power to enable ionisation of the process gases. The UMM zone is used to mix and deposit source material on the substrate with a uniform coverage. The Reaction Zone is used for the deposition and etching of the wafers and the creation of patterns, features and other microstructures. The four transport modules are responsible for the movement of the substrates and the transport of the heated gasses in the chamber. The first two modules, the Load and Unload, are located outside the chamber. They open and close to introduce wafers into the chamber and to remove them after the process is completed. The remaining two modules, the Shuttle and GIS, form the tight seal around the process chamber, allowing the heated gasses to be recirculated and preventing them from escaping. Finally, P 5000 reactor is equipped with a Reaction Module, which consists of process chambers that regulate the pressure and provide the DC power and RF power needed for the desired process. This incorporates a set of process electrodes, AC and DC power supplies, a plasma generator, and a programmable digital controller. In summary, APPLIED MATERIALS P5000 reactor is a robust, high-temperature process chamber capable of sustained high temperature processes. It utilizes a combination of high-voltage and plasma to catalyze high-end processes. The design is flexible and efficient, enabling production of high-quality parts with complex structures.