Used AMAT / APPLIED MATERIALS P5000 #9291957 for sale

AMAT / APPLIED MATERIALS P5000 is a chemical vapor deposition (CVD) equipment designed for the production of thin film deposition. This highly efficient reactor was designed to process silicon, germanium and gallium nitride layers with thicknesses as thin as 5nm. The reactor has a circular chamber with dimensions of 300 mm in diameter and 250 mm in length. The base of the chamber consists of a high-temperature furnace with a 12 kW capacity. This unique design allows the temperature of the chamber to be precisely controlled and the deposition rate further optimized. AMAT P-5000 reactor is equipped with an advanced magnetic-suspension mechanical vacuum pump that provides atmosphere-free vacuum levels. With this low pressure system, the deposition rate of silicon, germanium, and gallium nitride are greatly increased. It is designed to maintain a very low pressure in the chamber to ensure a highly uniform layer growth over the entire substrate. The unit also features an advanced gas delivery machine to facilitate precise control of process gases. The tool supports a number of process gases, allowing for versatile deposition. APPLIED MATERIALS P 5000 is designed with an AS-PET Poly Hot Lamp that has the ability to heat the substrate up to a maximum temperature of 1,000°C. This feature allows for the use of a range of substrate materials, such as polysilicon, polysilicate glass, polyarylene oxide, and polyphthalamide. As an additional feature, P5000 utilizes a uniquely designed quartz lamp which allows for a fine-grained process control. The stability of the asset is also crucial to the quality of the thin-film and here AMAT P 5000 excels. The chamber is sealed to prevent any short-term atmosphere fluctuation, while the closed-loop gas delivery ensures the chamber is kept permanently at a constant pressure. The highly advanced temperature control and stabilization systems also ensure that the chamber is kept at a consistent temperature and pressure to ensure thin film layers of the highest quality. In terms of handling, P-5000 reactor is incredibly efficient. Equipped with a built-in cooling model and fan, the equipment is able to quickly cool the substrate without needing any external cooling source. Furthermore, thanks to its lightweight construction, the chamber is extremely easy to access and handle. APPLIED MATERIALS P5000 is designed with compact dimensions, allowing it to be placed on almost any laboratory table. Overall, APPLIED MATERIALS P-5000 is an effective CVD system designed for the production of thin film layers. It offers precise temperature control and extremely durable, repeatable results. It is ideal for the deposition of a wide range of materials and has proven to be a popular choice amongst researchers and industrial professionals.