Used AMAT / APPLIED MATERIALS P5000 #9291959 for sale

AMAT / APPLIED MATERIALS P5000
ID: 9291959
Wafer Size: 6"
System, 6" PTEOS Chamber Oxide etch chamber SiN Chamber Short elevator.
AMAT / APPLIED MATERIALS P5000 is a multi-chamber process reactor that is versatile, user friendly, and reliable. It was developed specifically to enable the deposition of various materials onto substrates in a reliable and highly repeatable manner. This makes AMAT P-5000 the perfect choice for a range of different applications, such as optical coatings, nanomaterials, superconductors, and semiconductors. APPLIED MATERIALS P 5000 is made up of three distinct chambers, including up to two production chambers and a separate loadlock chamber. The production chamber is responsible for controlling the physical parameters that are responsible for the reaction and deposition of the materials. This chamber has independent gas lines, enabling single or multiple gas sources simultaneously, making the equipment perfect for all proportional depoistion techniques. A separate loadlock chamber ensures the production chamber remains properly pressurized and at a stable temperature. The remainder of the system features a range of highly advanced features that ensure repeatable processes and reliable deposition. This includes elements such as an intuitive graphical user interface, real-time unit control and monitoring capabilities, and a range of temperature control elements and safety features to ensure the exacting requirements are always met. P 5000 machine also features two separate Vacuum Subsystems, which provide a range of capabilities based on the specific requirements of the substrates to be used. The first Vacuum Subsystem is optimized for metal and metal oxide deposition and the second for oxide, resistive, and other non metal deposition processes. This flexibility permits the tool to be used with different types of substrates, increase asset roughness, and allow for a range of deposition kinetics. Overall, AMAT / APPLIED MATERIALS P-5000 is the perfect choice for anyone looking for precise and repeatable deposition of a variety of different materials. With its three-chamber design, advanced user interface, intuitive real-time control and monitoring capabilities, and precise temperature control and safety elements, the model offers a high degree of reliability and accuracy. Combining this with its fast production processes and Vacuum Subsystem capabilities, P-5000 reactor is sure to provide the precise results required for a variety of different applications.
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