Used AMAT / APPLIED MATERIALS P5000 #9291960 for sale

AMAT / APPLIED MATERIALS P5000
ID: 9291960
Wafer Size: 8"
System, 8" (3) WSix Chambers Short elevator.
AMAT / APPLIED MATERIALS P5000 is a cylindrical plasma reactor designed for use in semiconductor processing applications. It is capable of processing full wafers up to 300mm in diameter and is equipped with a fast-pulse, high-power generator. The equipment utilizes a single process chamber with an RF window for the plasma generation and interference suppression. The system provides a uniform and repeatable process, meaning production times can be minimized and product quality maintained. AMAT P-5000 includes a high-power frequency-pulse generator, with a proprietary plasma array design. This patented design utilizes low-power switching elements and cathodes with increased life and uniform plasma output. The frequency-pulse generator enables users to generate tightly controlled discharges over a range of temperatures and pressures. This technology ensures a stable and reliable plasma process, while reducing maintenance and operating costs. APPLIED MATERIALS P 5000 also features a shield-gas unit, housing internal gas sources and distribution networks. The machine allows users to select the desired process gases, such as argon, nitrogen, and hydrogen, and delivers them at user-specified proportions and flow rates to the plasma chamber. This allows for tight process control of the etching, and deposition processes. AMAT P 5000 is built for precision and uniformity, and is equipped with a variable pressure control tool. This allows the chamber to be set to desired pressure and ensures that uniformity across the entire wafer. Additionally, the asset includes an integrated process monitoring and diagnostics model. This equipment records information from each process step and allows users to view, measure, and adjust process recipes. P-5000 is a powerful and reliable tool for semiconductor manufacturing processes. With its comprehensive high-power plasma generation and controlled uniformity capabilities, it enables users to achieve the highest yields. Its cutting-edge features ensure that processes are repeatable, efficient, and reliable.
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