Used AMAT / APPLIED MATERIALS P5000 #9293601 for sale

AMAT / APPLIED MATERIALS P5000
ID: 9293601
Wafer Size: 8"
Vintage: 1996
CVD System, 8" Process: LTO CVD, TEOS 1996 vintage.
AMAT / APPLIED MATERIALS P5000 is a chemical vapor deposition (CVD) reactor used in semiconductor fabrication processes. Designed to optimize reaction rates, this reactor works by introducing a reaction gas into the reactor chamber, which is then heated to a predetermined temperature and pressure. A reaction chamber filled with inert particles is used to absorb the reaction gas molecules, which in turn triggers a series of chemical reactions that grow a thin film onto a substrate surface. AMAT P-5000 reactor has a closed-loop, furnace-style design that maintains a stable temperature, allowing for precise control of the deposition process. The chamber works by introducing a reaction gas into the space to be heated and pressurized. The applied power and the pressure in the chamber are then used to manipulate the reaction rate, which in turn affects the Deposition rate and quality of the thin film. The temperature range and the pressure range of the chamber can both be set by the user, allowing for precise control over the chemical reactions within the chamber. APPLIED MATERIALS P 5000 also features a vapor-phase clustering system to control the directional deposition of particles and to eliminate any material buildup on the walls of the chamber. Additionally, a pulse-enabled etch system is designed to improve the quality of the thin film's surface finish. P5000 is capable of processing a variety of materials that include metals, inorganics, organics, and oxides. As the film is being deposited, the reactor also works to monitor the process in real-time, allowing the user to control and adjust the conditions within the chamber, such as the rate and quality of the film. This ensures superior film quality and prevents material buildup in the chamber's walls. P 5000 reactor offers excellent temperature uniformity, uniform deposition rate, and steady control of film thickness for a variety of thin film applications. This reactor is frequently used in thin-film research, semiconductor fabrication, and thin-film solar cell manufacturing.
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