Used AMAT / APPLIED MATERIALS P5000 #9294424 for sale

AMAT / APPLIED MATERIALS P5000 Reactor is a high-performance, advanced deposition equipment designed for use in the semiconductor and solar energy industries. It allows for the deposition of thin films, such as SiO2, SiN, Al2O3, TiOx and other dielectric materials, and metal films and layers, such as tantalum and titanium, to produce a wide range of semiconductor products and solar cells. AMAT P-5000 Reactor consists of a Cluster Platform, where substrate holders are placed, and an ALD Chamber, which houses the deposition materials. The Cluster Platform has adjustable height and tilt angle to ensure maximum uniformity of deposition and maintain the desired coating thickness. The ALD Chamber contains an array of adjustable zones that can be set to desired pressures, temperatures, and precursors required for deposition. This chamber also houses an RF Coaxial Plate that provides an RF power supply and allows for stable, uniform processing. APPLIED MATERIALS P 5000 Reactor utilizes several advanced technologies to ensure optimal deposition results. The Multi-Platform Mapping (MPM) feature allows for efficient matching of deposition parameters between substrates. This mapping feature also yields high uniformity deposition rates for each substrate. The Choreographic Gated Delivery (CGD) feature accurately disperses and delivers precursors to the deposition area, allowing for precise control of film thickness. The FueliCom reactor control technology allows for more accurate monitoring of time, temperature and pressure, while the autofocus system provides high-precision deposition of conductive patterns and layers. AMAT / APPLIED MATERIALS P 5000 Reactor also offers enhanced productivity, with a capability of a wide range of substrate sizes and film thicknesses. The variable feature set allows for uniform deposition of conformal layers and minimal film stress. Additionally, AMAT / APPLIED MATERIALS P-5000 Reactor can operate in a variety of modes for continuous or pulsed operation, and offer uniform film properties. The user-friendly, menu-driven software can be integrated with outside applications for further control and monitoring. In summary, P 5000 Reactor is an advanced deposition unit designed for use in the semiconductor and solar energy industries. It features various advanced technologies, such as multi-platform mapping, choreographic gated delivery, fuelicom reactor control, autofocus and a user-friendly menu-driven software, to provide precise control and uniform deposition of thin films and metal layers. This machine is an ideal choice for producing a wide range of semiconductor products and solar cells.