Used AMAT / APPLIED MATERIALS P5000 #9294470 for sale

AMAT / APPLIED MATERIALS P5000 is a chemical vapor deposition (CVD) reactor designed for industrial use. This reactor provides a critical enabling technology for a broad range of semiconductor, LED and flat-panel display manufacturing applications. It is a single- or dual-wafer, quad-chamber reactor with a rotating susceptor and is capable of depositing dielectric, semiconducting and metal thin films. The reactor is equipped with a motorized wafer carrier capable of speeding up or slowing down its rotation as required. Two load locks provide first-in, first-out (FIFO) loading of up to two process wafers into the four induction-heated chambers. The wafer carriers' motion ensures precise heating of both sides of the wafer. The chambers are heated through four identical susceptors each powered by a single adjustment knob. This allows for precise control of the temperature of each chamber. The process gases are supplied from a single process gas supply manifold. Process operation pressures are electronically monitored by two capacitance manometers for optimal vacuum control. AMAT P-5000 reactor also features self-diagnostic features and data recording. The wafer transfer is tracked and monitored via a camera system that logs wafer tracking data in the reactor controller's memory. In addition, APPLIED MATERIALS P 5000 allows for various process configurations by providing uniform deposition over the entire surface of the wafer. The design of P-5000 is both flexible and reliable and the reactor can be used with a range of materials including SiN, AlN, SiO2, CET and tungsten. The high throughput rate, short cycle times and reliable operation of APPLIED MATERIALS P5000 make it a cost-effective and efficient choice for industrial-scale production of thin films.