Used AMAT / APPLIED MATERIALS P5000 #9308744 for sale

AMAT / APPLIED MATERIALS P5000
ID: 9308744
Wafer Size: 8"
Vintage: 1996
CVD System, 8" (2) DxL Chambers 1996 vintage.
AMAT / APPLIED MATERIALS P5000 is a chemical vapor deposition (CVD) reactor designed for high-volume production of epitaxial and homoepitaxial substrates and wide-bandgap semiconductor devices, such as silicon carbide, gallium arsenide, and InP. This equipment utilizes an AMAT diffusion and chemical reaction process to deposit thin, conformal materials on a substrate. AMAT P-5000 is a high-volume system that can produce up to 1,000 wafers per hour and is designed to grow wide band gap substrates. It utilizes a reaction zone, diffusion zone, and gas zone, which allows for the formation of hexagonal epitaxy crystals. By controlling the atmospheric pressure, process temperature and flow rate, APPLIED MATERIALS P 5000 is capable of producing ultra-thin films and homoepitaxial layers. APPLIED MATERIALS P-5000 utilizes a two-zone process which features a pre-reaction zone and a main reaction zone. In the pre-reaction zone, the gases are introduced at a specific flow rate and temperature. The generated plasma breaks the molecules down into smaller fragments, which are then transported to the reaction zone. In the reaction zone, the fragments are deposited onto the substrate as a thin and conformal layer. The flow rate is also ramped up and down as necessary for optimal processing control. P5000 reactor also features digital temperature control, pressure control, and RF matching which allows precise control of the process parameters. The open chamber design also helps to ensure that different gases and compounds can be used for specific applications. The unit is certified for optimum safety with anti-static components for enhanced reliability. AMAT / APPLIED MATERIALS P 5000 is a versatile and efficient tool for growing advanced materials. By controlling the atmospheric pressure, process temperature, and flow rate, the machine can reliably grow high-quality substrates and materials that are ideal for semiconductor devices. Through precise control and enhanced safety features, AMAT / APPLIED MATERIALS P-5000 can provide the high-performance materials needed to realize next-generation technologies.
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