Used AMAT / APPLIED MATERIALS P5000 #9308754 for sale

AMAT / APPLIED MATERIALS P5000 is a type of AMAT reactor that is primarily used for processing semiconductor materials. It is a high-tech device that can be used for a variety of applications, including chemical vapor deposition (CVD), atomic layer deposition (ALD), and physical vapor deposition (PVD). AMAT P-5000 is capable of processing materials at temperatures up to 200 degrees Celsius. APPLIED MATERIALS P 5000 is a single-wafer, high-throughput, batch-style reactor. The reactor chamber is designed with six thermally isolated zones that can be heated up or cooled down independently. This helps to enable uniform thermal distribution throughout the chamber. The chamber is also equipped with a 4-gas hopper, an advanced pressure control equipment, an electro-optical viewport, and a differential gas flow configuration. AMAT / APPLIED MATERIALS P 5000 features a unique patented cold-wall configuration which enables high-throughput processing at lower temperatures. It also has an optional e-beam heating technology, which allows for high-temperature processing with excellent thermal uniformity. AMAT P 5000 also features a 'Quartz Spacers Between Wafers' (QSBW) mode, which helps enhance uniformity and reduce particle formation. In addition, P-5000 can be customized with an integrated load-lock system for loading and unloading of large batch sizes. This unit is also equipped with a vacuum-isolated handling arm, as well as an automated RF/DC plasma source. AMAT P5000 also has a Closed Hot Platform (CHP) cooling manifold designed to provide uniform cooling throughout the chamber and at the wafer level. APPLIED MATERIALS P5000 is a versatile and reliable reactor machine which provides automated, self-monitoring processes for material processing on the micro and nanoscale. It is a reliable, cost effective solution for various types of CVD applications, from thin films and membranes to complex structures.