Used AMAT / APPLIED MATERIALS P5000 #9311420 for sale
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ID: 9311420
Wafer Size: 6"
PECVD System, 6", parts machine
Chuck type: Standard
(2) Chambers
Boards
(8) Wafers storage cassette
(2) Atmospheric cassette nests
Remote control box
Frame
Pentagonal load chamber
Robot assembly
Heat exchanger
Mass Flow Controllers (MFC)
I/O Cards
Remote panel module
Stepper motor driver cabinet
Indexer has been removed
RF Matching has been network removed
No ESC
No turbo pump
No mechanical pump
No AC power box
No generator rack.
AMAT / APPLIED MATERIALS P5000 is a chemical vapor deposition (CVD) reactor typically used to deposit thin films on semiconductor or related substrates. It uses a low-pressure, or vacuum, CVD system in which precursor gases are introduced into the process chamber, reacting with the substrate in order to deposit the desired thin film. AMAT P-5000 is designed to accommodate up to eight single wafer substrates at once, and it can be configured with various components, allowing for specific process requirements. The process chamber is constructed out of aluminum; with a quartz viewport affording visual inspection of the substrate while processing. The chamber is also equipped with a resistively-heated electronic deposition source, and a shower head assembly. The electronic deposition source provides the substrate with the energy needed for the process to occur, while the shower head assembly is used for a wide variety of pre- and post-processing procedures, including pre-cleaning, plasma etching, and post-cleaning. The chamber also includes mass flow controllers (MFCs) for controlling the introduction of precursor gases into the process chamber, as well as quartz liners for maintaining superior process uniformity. The controller for APPLIED MATERIALS P 5000 is a single-board computer system with a 5-inch, color VGA display, a mouse, and a membrane keypad, which allows the user to input commands. It also includes over 100 recipes capable of storing recipes to recall at a later time. AMAT / APPLIED MATERIALS P 5000 is capable of depositing a wide range of materials and thin films, including dielectric materials such as aluminum oxide, nitrides, and oxides. This system is also used to deposit metals such as aluminum, nickel, and titanium. Beyond that, P 5000 can also be configured to process organometallic gas sources. In conclusion, AMAT P5000 is an important tool for thin film deposition, used extensively in the semiconductor industry. The various components of AMAT / APPLIED MATERIALS P-5000 allow for excellent process uniformity and control, as well as the ability to process many different types of materials.
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