Used AMAT / APPLIED MATERIALS P5000 #9313502 for sale

AMAT / APPLIED MATERIALS P5000 is a high-power, high-yield plasma etch chamber designed for use in advanced lithography and semiconductor processes. This plasma etch chamber is used for precise etching of a wide range of materials, including metals, polymers, dielectrics. It can operate at up to 50 mBar and TEMPERATURES OF UP TO 500°C, enabling highly precise etching that allows for precise control of the etch profiles. AMAT P-5000 has revolutionized etching processes, providing precise etching of complex micro-electronic components with faster yields. The primary benefit of APPLIED MATERIALS P 5000 lies in its combination of high power source and precise chamber design. The reactor utilizes a high-powered, all-station type of plasma source with a wide range of frequency capabilities. This allows for precise control over the etch rate and shape of the feature by controlling both the RF frequency and the applied magnetic field. Also, the use of advanced gas mixing and pressure control guarantees an etch depth uniformity of up to +/- 1%. P5000 also boasts of its ability to maintain precise temperatures within the reactor. The chamber is cooled using a closed-loop water system, allowing for tight temperature control that guarantees uniform etching across a target area. This also serves to enhance safety, preventing corrosion and other reaction-related damage of the target material. APPLIED MATERIALS P-5000 includes a number of integrated sensors and diagnostic tools that allow for quick and easy process control. Control of process parameters can be monitored and adjusted in real-time, enabling users to easily fine-tune the etching process for optimal performance. With cutting-edge technology and a robust design, P 5000 is an advanced reactor that enables superior etching process performance and precision. From small electronic components to larger-scale devices and systems, AMAT / APPLIED MATERIALS P-5000 offers a reliable, cost-effective solution for high-yield etching.