Used AMAT / APPLIED MATERIALS P5000 #9351563 for sale
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ID: 9351563
Wafer Size: 8"
Vintage: 2000
CVD System, 8"
Chamber A / B / D:
Type: DCVD Universal
Process: Delta / TEOS
Process kit: Plasma C-Chuck
Manometer: Dual 20-1000 Torr / MKS
Clean method: RF Clean
Throttle valve: Direct drive dual spring W/C plug
Gas box MFC: UNIT MFC
Lamp driver
RF Match: Phase IV
Chamber C:
Process: Sputter etcher
Standard process kit
Manometer: Single Torr / MKS
Clean method: RF Clean
Standard throttle valve
Gas box MFC: UNIT MFC
21-Controller slots
Floppy Disk Drive (FDD), 3.5"
Robot type: Phase III
Auto-load / Unload cassette handler
Silicon-Tin-Oxide (STO) elevator type: 15-Slots
WPS Sensor
I/O Wafer sensor
Loadlock purge
Loadlock slow vent
Slit valve type: ZA Slit valve
Hot box version: Version IV
Top / Standard exhaust line
(28) Gas line panels
Mini controller
Missing parts:
Turbo pump (Chamber C)
RF Match (Chamber C)
SBC Board
Video board
Ampule
RF Generator OEM 12B I, II
2000 vintage.
AMAT / APPLIED MATERIALS P5000 reactor is a robust, high performance production tool designed to enable the deposition of materials ranging from alloys to oxides to dielectrics with complete surface coverage and optimized microstructures. The reactor is powered by a highly efficient source with a pulsed electron beam and a high-efficiency ionizer, capable of producing high deposition rates with a high degree of coverage and homogeneity. AMAT P-5000 reactor has an integrated, high power pulsed electron beam (PEB) that uniformly decelerates ions, allowing for uniform coverage in a broad range of etch processes, offering complete coverage to deep structures. The PEB also allows for high-temperature annealing of the materials during deposition, allowing for improved metal bonding and better material properties. An adjustable dual-direction end-effusion ionizer allows for fine tuning of ion populations, which enables efficient ion bombardment and uniform coverage of the substrate. APPLIED MATERIALS P 5000 is a high throughput, cost-effective reactor system with a wide range of applications. It is suitable for a range of processes in the field of microelectronics, including deposition of dielectrics, metal evaporation, and plating of metals. The reactor is also well-suited for deposition of organic, inorganic and hybrid films such as insulators, conductors, and other types of substrates. Moreover, the reactor is suitable for both hard and soft annealing processes to modify the properties and microstructure of the substrate. P-5000 reactor features a multi-stage design that enables high-speed washing of wafers prior to deposition, and drying of wafers after etching is complete, for improved processing quality. The system also includes a dedicated plasma monitor to ensure efficient and accurate control of chamber parameters. Moreover, APPLIED MATERIALS P-5000 utilizes a gas panel, enabling users to employ a wide variety of gases for calibration or chamber cleaning. The highly efficient P5000 reactor is ideally suited for production level operations in a wide range of applications, and is backed by AMAT extensive technical support, training, and services. P 5000 is an ideal solution for semiconductor manufacturing processes requiring high quality, reliable, and repeatable results.
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