Used AMAT / APPLIED MATERIALS P5000 #9356942 for sale

AMAT / APPLIED MATERIALS P5000 is an advanced Plasma Enhanced Chemical Vapor Deposition (PECVD) equipment for the deposition of thin films and materials for a variety of applications. The system uses a microwave plasma source and water-cooled showerhead plates to generate uniform and conformal films of polysilicon, silicon nitride, silicon oxide, and other materials with precise thickness control. AMAT P-5000 utilizes a remote microwave generator and a unique Advanced Energy Delivery Unit (AEDS) for precise control of power, pressure and gas delivery to the PECVD chamber. The microwave source consists of a wide range of frequencies from 2.45 GHz to 2.75 GHz, allowing for optimal film deposition conditions. The AEDS is designed to keep the microwave power, RF power and gas flows precise and constant, independent of chamber pressure. APPLIED MATERIALS P 5000 reactor itself is a quartz chamber, which provides excellent uniformity over a large area. The process chamber features a full enclosure and an automated tuning machine to ensure precise pressure, temperature and RF matching. P 5000 also features a large flat sample holder that accommodates substrates up to 8" in diameter and up to 1/2" thick. The process time is controlled by APPLIED MATERIALS P-5000 tool software, allowing precise control of film deposition rate, gas flows, pressure and temperature. AMAT P5000 is suitable for a wide variety of applications in low temperature and high temperature deposition processes. It can be used to produce thin films such as polysilicon, silicon nitride, and silicon oxide for use in semiconductor device fabrication. Its precise control and uniformity produces highly conformal and extremely smooth thin films for high quality and reliable performance. AMAT / APPLIED MATERIALS P 5000 is an ideal tool for R&D, process development, and production use.