Used AMAT / APPLIED MATERIALS P5000 #9377267 for sale

AMAT / APPLIED MATERIALS P5000 is an inductively-coupled, high-density plasma reactor that is designed to deliver precise processing control and performance for advanced deposition and etching of thin films. With its ability to deliver high deposition rates and excellent uniformity, AMAT P-5000 is the ideal choice for use in semiconductor and data storage device fabrication. APPLIED MATERIALS P 5000 utilizes advanced plasma processing technology to deliver superior deposition and etching performance. The reactor is equipped with a plasma generation source and advanced power delivery system that allows for precise control of plasma properties. This allows for precise control of film thickness, purity, and combination of materials that can be deposited and etched. APPLIED MATERIALS P5000 is also capable of sustaining high-density plasma operation for in-situ doping, generating reactive ion etching processes, and providing uniform and precise process control. Additionally, AMAT P 5000 features a wide range of product enhancements that make it the ideal choice for high-volume production. These include advanced substrate heat management, precise control of process deposition conditions, and enhanced process repeatability due to its uniformity of plasma characteristics. Additionally, P 5000 is equipped with a robotic loadlock and alignment system that ensures precise substrate handling and accuracy. AMAT P5000 is a robust and reliable reactor, capable of providing precise control parameters for advanced thin-film deposition and etching with high deposition rates and excellent uniformity. Its advanced plasma processing technology ensures precise control of film thickness, purity, and combination of materials that can be deposited and etched, and its wide range of product enhancements make it an ideal choice for high-volume production.