Used AMAT / APPLIED MATERIALS P5000 #9377269 for sale

AMAT / APPLIED MATERIALS P5000
ID: 9377269
Wafer Size: 8"
Poly etcher, 8".
AMAT / APPLIED MATERIALS P5000 is a high-performance production reactor that utilizes Ultrashort Pulse (USP) laser processing technology to enable precise and predictable deposition of particulate or bulk materials onto substrates. It is a metal-organic chemical vapor deposition (MOCVD) equipment that enables the growth of metal-organic films on substrates at high temperature. The modular system of AMAT P-5000 is built on an efficient platform and provides superior control of feature sizes, excellent material interactions, and reliable film properties. Its load lock capability helps to achieve superior film uniformity while maintaining low power consumption. The unit has a powerful software platform, which enables users to program and control the process parameters, such as pressure, temperature, gas flow, and material injection. It can also be configured to produce a wide range of material compositions, such as III-V alloys, polysilicon, oxides, nitrides, and a variety of other specialized materials. Additionally, APPLIED MATERIALS P 5000 provides the ability to monitor and adjust the film thickness in real-time to ensure reliable and repeatable performance. The reactor chamber is designed to create a uniform flow field and ensures a uniform deposition rate across the entire substrate. It is capable of high-temperature and high-pressure processing, and is designed to minimize material loss and contamination. The chamber features multiple gas and source injectors for precise control of deposition rates, and can perform large-area wafer and substrate coating. P 5000 is equipped with a host of safety features to ensure safe and accurate operation. These include temperature and pressure interlocks, automatic shut-down protocols, and corrosion and contamination protection. The machine also includes a chamber doping tool, enabling precise doping of the substrate with nitrogen or carbon compounds, and sensors to monitor substrate temperatures, chamber pressure, and material/gas levels in the chamber. The advanced USP laser process of P5000, along with its other features, makes it a versatile tool for performing a variety of deposition processes. Its superior uniformity and control over the deposition process, along with its reliable safety features, make AMAT / APPLIED MATERIALS P 5000 an excellent choice for high-performance production environments.
There are no reviews yet