Used AMAT / APPLIED MATERIALS P5000 #9377274 for sale

AMAT / APPLIED MATERIALS P5000 reactor is an advanced ion implantation equipment designed to deliver superior performance in a wide range of process and integration requirements. Utilizing state-of-the-art ion source technology, AMAT P-5000 reactor provides process speeds up to 500 wafers per hour, making it one of the fastest deposition systems on the market today. The system allows users to tailor their implant processes to meet their specific needs through the use of advanced pre-plasma and post-plasma controls. This allows users to optimize the implant process for all production conditions. The pre-plasma optimization provides enhanced ion energy uniformity across the entire wafer and allows for greater process control during implantation. The post-plasma phase, meanwhile, allows the process to be tailored for different device structures, further improving control and reliability. APPLIED MATERIALS P 5000 also features a built-in controlling interface for easy and reliable operation. This allows users to adjust parameters as needed, allowing for more efficient implant processes. The embedded end-point monitoring functionality enables users to quickly modify step-and-repeat programs and other key parameters, helping to reduce cycle times and maximize process productivity. To ensure superior film quality, AMAT P5000 utilizes closed-end, low-gas-load furnaces to maintain vacuum. This reduces the number of particles and impurities in the substrate, forming a higher-quality film. This is further enhanced by the built-in collimation unit, which provides a uniform and targeted implantation of ions. Finally, P-5000 is designed utilizing advanced analog and digital feedback systems that allow for improved process control and customization. For example, users can adjust total implant rates and sweep width. This makes it easier to handle process variations, further enhancing process accuracy and control. APPLIED MATERIALS P-5000 is a powerful and reliable machine boasting superior performance and capabilities. Through advanced ion source technology, pre- and post-plasma optimization, a built-in controlling interface, and other features, AMAT P 5000 provides users with a streamlined approach to their ion implant process, improving productivity, yield, and repeatability.