Used AMAT / APPLIED MATERIALS P5000 #9377275 for sale

AMAT / APPLIED MATERIALS P5000 is a reactor designed for intermetal dielectric deposition applications. AMAT P-5000 features a four-chamber vapor delivery equipment which provides the trend-setting flexibility and superior long-term performance required for complex, high-aspect ratio processes. APPLIED MATERIALS P 5000 features a number of advanced features such as an integrated process comolobulator, quad-reshield high-vacuum multi-chamber turbo pump/charger and an Allen-Bradley PLC controller for data acquisition and process control. P5000 utilizes high-power RF and DC power supplies to enable deposition on a wide range of wafers including dummy, polytest and film coated wafers. The system also includes a programmable digital user interface that allows users to set the desired film thickness and the operating temperature range. AMAT / APPLIED MATERIALS P-5000 also offers multiple programmable RF frequencies to optimize the process for different integration schemes. P-5000 features a four-chamber vapor delivery unit that consists of a turbo pump/charger, an inert gas injection manifold, an infiltration manifold, reactive gas injection manifold and a reaction chamber. This arrangement provides for the greatest control over deposition rates and process consistency. The infiltration and reactive gas injection manifolds enable AMAT / APPLIED MATERIALS P 5000 to deposit metal and dielectric layers with uniform thickness and excellent coverage. The reaction chamber is heated with precision controlled multi-zone heating elements to ensure uniform temperatures throughout the deposition process. To further ensure process control, APPLIED MATERIALS P5000 includes a machine of integrated optical pyrometers and protective shielding. The optical pyrometers measure the heat within the reaction chamber to ensure process temperatures remain within critical specifications. The shielding helps protect the substrate and process gases from any generated electrical discharges within the tool. P 5000 provides a complete range of process tools to accommodate specialized substrates, design rules, and process requirements. The asset provides additional substrate handling tools for specialty wafer types, as well as a variety of protective coatings for oxidation protection, process uniformity, and particle control. The model also offers end-point control tools to limit reaction temperature, prevent contamination and improve reproducibility. In summary, APPLIED MATERIALS P-5000 is designed for intermetal dielectric deposition applications and features a four-chamber vapor delivery equipment and advanced features such as an integrated process comolobulator and a programmable user interface. The system also includes multiple RF frequencies and integrated optical pyrometers and protective shielding to ensure process control. The unit offers additional process tools to accommodate specialized substrates, design rules, and process requirements.