Used AMAT / APPLIED MATERIALS P5000 #9383379 for sale

AMAT / APPLIED MATERIALS P5000 is a plasma CVD reactor used for surface modification and deposition of a range of material layers. The Plasma CVD technique employed by AMAT P-5000 is a low-pressure process which utilises a mixture of gases that are ionised with the use of a plasma to create the reactions and deposition necessary for surface modification. The vessel through which the process is carried out is built of stainless steel and is double-walled to ensure uniform pressure and temperature control. The chamber is loaded with a component large enough to accommodate various process needs, arranged on an integrated electrode. The interior of the vessel is then sealed and a pump begins to remove air and other gases, creating a vacuum within the sealed vessel. The generation of a plasma is achieved by introducing a mixture of required gases a high speed and at a low pressure, through the part of the vessel. A vacuum is produced using an RF generator and an inductor coil. The mixture of gases is then ionised by the magnetically generated high-energy field. This plasma provides a high concentration of electrons and ions that can break down molecules and react with the component in the vessel. APPLIED MATERIALS P 5000 is well known for its flexibility and robust design, as it can accommodate a variety of component shapes and sizes. Processes achievable with P-5000 include nitriding, etching, and silicon deposition, among others. Additionally, the system can serve as an injector for a variety of doping processes. The versatility of APPLIED MATERIALS P-5000 has made it a workhorse for many research laboratories in industry and academia, and its ability to produce high quality results make it a preferred choice for a multitude of surface modification needs. AMAT P5000 is an efficient, durable and reliable solution for improving material surface and overall performance of components.