Used AMAT / APPLIED MATERIALS P5000 #9384753 for sale

AMAT / APPLIED MATERIALS P5000 reactor is a high-efficiency, high-precision thin film deposition reactor designed for a range of processes. It is used for the deposition of thin films onto the surfaces of substrates in a variety of settings, from research and development to production areas. The reactor can be used to produce a wide array of films, from thin metal films to multi-layer films, as well as transistors and other semiconductor components. AMAT P-5000 reactor is designed for maximum deposition efficiency and deposition layer uniformity with minimum temperature impact on substrates. The reactor is built with a special Quad-vacuum-hybrid-magnetic-field technology. This ensures that all films are grown in a uniform and ideal deposition environment. This method also allows for a highly efficient process that uses fewer resources and time. The control systems also ensure that the deposition process is controlled and monitored on a continuous basis. The reactor consists of several modules that are easily interchangeable. The evaporation source and the showerhead are the two main modules. The source module contains up to four evaporation sources that can each hold different materials for deposition. The showerhead provides the main gas path and the uniformity of the thin films. The temperature control module allows for the precise temperature settings for better control of the deposition process. APPLIED MATERIALS P 5000 can also be used to deposit thick films and multi-layer films with good coverage, stability and adhesion. The reactor is ideal for producing layers with optical, electrical and thermal properties. Its flexible design allows for the easy manipulation of deposition parameters to optimize the deposition and layer uniformity. The construction of P-5000 reactor has been carefully designed to ensure safety, efficiency and accuracy. The reactor is constructed with an ultra-high purity chamber, high-precision valves and components for maximum reliability and accuracy. The reactor also offers ease of maintenance and a high degree of process flexibility and control. Overall, AMAT / APPLIED MATERIALS P 5000 reactor is an ideal tool for producing thin films, multi-layer films and thick films of excellent quality and uniformity. Its smart Quad-vacuum-hybrid-magnetic-field technology and the easy-to-use control systems make it a great choice for high-precision, high-efficiency thin film deposition.