Used AMAT / APPLIED MATERIALS P5000 #9384772 for sale

AMAT / APPLIED MATERIALS P5000 is a next generation chemical vapor deposition (CVD) reactor designed for the high performance deposition of nanomaterials. This reactor is capable of single-wafer processing at temperatures up to 500°C while providing low thermal mass with uniform temperature across the wafer surface. AMAT P-5000 offers a 4-zone vertical reactor design with independent thermal regulation and cool gas assist provisions. APPLIED MATERIALS P 5000 features a two-stage heated showerhead that enables uniform diffusion of reactant molecules throughout the deposition chamber. The showerhead is comprised of vertically stacked cooling pockets that ensure that the reactant molecules are evenly distributed across the wafer surface. In addition, P5000's thermal control equipment is designed to achieve high temperature uniformity and stability for consistent process results. Its programmable control interface allows for the adjustment of reactant composition, pressure, and temperature settings. AMAT / APPLIED MATERIALS P-5000 reactor's rapid process capability is enabled by the use of a fast gas control system. This unit allows for precise adjustment of the gas flow rate, resulting in faster process times with higher throughput rates. In addition, to ensure uniformity and repeatability, P-5000 is equipped with a purge cycle that flushes unwanted contamination from the deposition chamber. This allows for both cost-savings and process reliability. In terms of safety, APPLIED MATERIALS P-5000 is designed to comply with the most stringent standards, including ASHRAE Class A/B, NFPA Class 1, and UL 945. The reactor incorporates an explosion-proof venting machine and gas detection systems to protect personnel and equipment from potentially hazardous process gases. AMAT P5000 reactor is suitable for a wide range of materials, including graphene, lamellar materials, and carbon nanotubes. When configured with the ADM dual cooling tool, AMAT P 5000 offers even greater temperature range and control for more intricate deposition processes. This allows for the production of high purity and performance oriented nanomaterials. Overall, APPLIED MATERIALS P5000 CVD reactor offers a reliable, cost-effective solution for the high-performance deposition of nanomaterials. Through its combination of precise temperature control and fast reaction times, P 5000 can help manufacturers meet the demands of today's toughest semiconductor manufacturing processes.