Used AMAT / APPLIED MATERIALS P5000 #9385160 for sale

AMAT / APPLIED MATERIALS P5000 is a high-end, high-throughput, multi-wafer processing reactor for use in production or research labs. It is compatible with standard 200mm wafers and offers 12" wafer capability with an option for as many as 24" wafer. The reactor offers superior temperature uniformity and process repeatability with a high level of thermal stability, enabling high performance results. AMAT P-5000 offers improved throughput with its integrated Multi-Module substrate loading, which reduces downtime and downtime costs. The reactor is capable of process steps such as etch, deposition, and sputter in a variety of configurations. Its advanced control equipment provides superior process control, along with the ability to monitor process conditions at all times. The system can easily be connected to other controllable peripherals, such as mass flow controllers (MFCs) and load-lock systems, enabling a wide range of process limitations to be dealt with effectively. APPLIED MATERIALS P 5000 also provides an up to 3000W substrate heater for faster process runs, as well as reduced gas consumption and improved handling of thermal cycles. The unified multiple process chamber unit enables concurrent multi-wafer tunneling for increased production throughput. The various process chamber configurations accommodate up to two 2-inch or one 3-inch wafers per process. The in situ monitoring offered through the control machine helps optimize the process without sacrificing throughput. One of the main features of this tool is its ability to handle a wide range of reactive etch and deposition processes, including wet etch, directional etch and sidewall deposition. Such processes require high levels of chemistry control and probe safety. The reactor offers enhanced safety features with in-situ gas delivery, purge gas delivery and an inert gas back pressure capability for enhanced wafer handling. P-5000 reactor is ideal for meeting the needs of today's demanding R&D and production requirements. Its advanced process controls and multiple internal process chamber configurations give users unparalleled control of their processes. The asset can easily be integrated into existing model architectures while still maintaining quality performance and reliability. With APPLIED MATERIALS P5000, users can achieve higher wafer throughput, improved process repeatability and greater process control.