Used AMAT / APPLIED MATERIALS P5000 #9389401 for sale
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ID: 9389401
Wafer Size: 6"
CVD System, 6"
SV21 SBC Board
Main frame type: Mark-II
Cassette indexer, 6" Clamp
8 Slots elevator
(2) CRT Monitor
Robots: Phase-III
Robot blade: Standard vacuum
Centerfinder: USE
Cap wafer sensor
AC Rack: 1 Shrink
Heat exchanger
EMO Option: Turn to rekease
EMO Button guardrings
Status light tower (Color / Position): Red, Yelow, Green, Blue
Signal cable: 25'
Flash hard disk drive
Floppy: 3.5" SCSI Driver
Gas panel: 12 Channels standard / Minicontroller
RF Generator:
Chamber A: OEM12B-02
Chamber B: OEM12B-02
Chamber C: OEM12B-07
Chamber:
Chamber position: A, B, D
Chamber type: DLH 1-Hole
Process: SiH4 Oxide
Heater type: Lamp
Susceptor type: Al
(3) Matchers
Delta nitride dual spring throttle valve
Gas panel: 20 Standard channels
Gas supply: Top down
MFC: UFC-1660
Manual valve: NUPRO
Pneumatic 2-Way valve: NUPRO
MKS 122B Baratron gauge, 10 Torr
Gases:
Gas / Range
N2 / 3 SLM
SiH4 / 100 SCCM
CF4 / 2 SLM
N2O / 2 SLM.
AMAT / APPLIED MATERIALS P5000 reactor is a high quality and reliable tool used in the semiconductor industry to improve process performance and monitor device reliability. This type of reactor typically consists of an ion source, process chamber, and an electron gun. The ion source is used to generate a controlled plasma that is used to deposit materials on the surface of the workpiece. The process chamber acts as a reaction chamber where the plasma is modified to the desired process conditions. This is accomplished by controlling the gas flow, pressure, power, and other parameters. The electron gun is a powerful beam of electrons that is used to physically modify the surface of the material being treated. The main features of AMAT P-5000 reactor are its ability to deliver precise and repeatable processing results, as well as its ability to perform sensitive process monitoring. This type of reactor relies on a multi-channel feedback system and advanced automation software to ensure consistent, repeatable results. This type of reactor also has an advanced diagnostics system that monitors the condition of components, allowing for more efficient use of resources. APPLIED MATERIALS P 5000 reactor is relatively compact and robust, making it ideal for use in harsh environments. It also has an integrated diagnostics system that monitors and records data throughout the entire process, allowing for efficient operations, troubleshooting and maintenance. Additionally, the unit provides a safe working environment, with safety functions that prevent and monitor accidental overheating or power shutdowns. P5000 reactor is well-suited for a variety of applications in the semiconductor industry and is often used in deposition and etching processes. It is capable of processing substrates with high electrical, thermal, and optical properties, making it suitable for a range of materials including polymers, ceramics, metals, and compound semiconductors. Furthermore, the reactor can be used for a wide range of processes, such as ion implantation, PECVD, sputtering, and a variety of chemical etching applications. In conclusion, APPLIED MATERIALS P5000 reactor is an advanced, reliable, and precise tool used in the semiconductor industry to improve process performance and enable more precise monitoring. It has a range of features that make it ideal for a variety of applications, offering precise and repeatable results, precise monitoring, and robust operation in a safe work environment. It is the perfect choice for precision processing in the semiconductor industry.
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