Used AMAT / APPLIED MATERIALS P5000 #9389533 for sale

AMAT / APPLIED MATERIALS P5000
ID: 9389533
WCVD System WxZ Metal.
AMAT / APPLIED MATERIALS P5000 is a 200mm, low-cost, rapid thermal processing (RTP) reactor. This equipment is specifically designed for use in advanced semiconductor device fabrication applications, and is optimized for integrated circuit (IC) production. It features a highly accurate process control system with precision temperature control to ensure consistent and repeatable processing in all applications. The unit is highly flexible and can be used for a variety of materials, including silicon, germanium, mixed-metal compounds, and many others. AMAT P-5000 reactor consists of a radiant gas-fired furnace, a tempering unit, and a process controller. The radiant gas-fired furnace 2 is heated with a combination of hydrogen, nitrogen, and argon, allowing the temperature of the furnace to remain consistently high during wafer processing. The tempering unit is a two-stage unit which allows temperature control throughout the range of the furnace, allowing for precise process control. The process controller is a powerful user-friendly interface, which allows the user to program the machine to carry out a range of applications. In addition, APPLIED MATERIALS P 5000 features a built-in data logging tool which allows users to document the data collected during each process, thus offering support for process development and application. APPLIED MATERIALS P-5000 offers a range of process capabilities, including oxidation, nitridation, alloying, doping, and diffusion processes. These processes can be applied for device fabrication, including fabricating transistor sources, bulky-thickness fittings, test structures, and more. Furthermore, the built-in process control asset allows for improved process repeatability, as the user can monitor and modify the environment variables to ensure consistent quality at every step. P5000 RTP reactor is highly flexible, allowing fabrication of a range of materials including but not limited to silicon, germanium, and mixed-metal compounds. By combining this flexibility with a robust process control model, UHP-grade materials can be accurately processed, allowing for improved yield and performance. In addition, the furnace can be run in a batch or continuous mode, allowing the user to tailor the process to their needs. Finally, AMAT / APPLIED MATERIALS P-5000 is designed with environmental-friendly features, allowing users to carry out processes with minimal environmental impact.
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