Used AMAT / APPLIED MATERIALS P5000 #9392286 for sale

AMAT / APPLIED MATERIALS P5000 Reactor is a high-performance instrument designed to help users make precise metal deposition parameters in the microelectronics, data storage, and optical industries. AMAT P-5000 Reactor provides precise, uniform and repeatable deposition process control. It is equipped with an integrated vacuum equipment allowing for excellent temperature uniformity and layer characteristics. APPLIED MATERIALS P 5000 Reactor is equipped with an alternating bias voltage deposition source. This alternates the deposition substrate between negative and positive charge over successive clock cycles, which helps to achieve an even film coverage and uniform grain size throughout the layer. In addition, an inert gas is added to the deposition chamber to reduce the sticking of particles and to achieve greater coverage consistency by aiding in the uniform distribution of the particles. P-5000 Reactor's advanced position control allows for precise movement of the individual wafers or target substrates relative to the sources. This enables uniform temperature distribution over the wafer and helps to assure high-quality deposition on the whole wafer. The system is designed with a mass flow controller and a PID controller, providing automated deposition control and precise temperature regulation. APPLIED MATERIALS P5000 Reactor is designed with a low thermal budget option to minimize the thermal stress put onto the wafer during deposition. This helps to reduce warping and other damage to the wafers. Through the use of an advanced control unit, AMAT P5000 Reactor helps to automate and reduce the complexity of the deposition process. P5000 Reactor is suitable for use with a wide variety of deposition techniques, including chemical vapor deposition (CVD) and physical vapor deposition (PVD). It is also equipped with a real-time monitoring machine that allows for analysis of the overall deposition process, tracking of tool performance and analysis of process recipes for individual layers. This helps the user to optimize operation, reduce downtime and improve overall process control. In conclusion, P 5000 reactor is a high-performance instrument with precise process control, yielding uniform and repeatable deposition processes. Its advanced control systems help automate and simplify the deposition process, while its low thermal budget capabilities help to reduce thermal stress placed on the wafers. This helps to ensure high-quality deposition as well as increased process stability and optimization.