Used AMAT / APPLIED MATERIALS P5000 #9396223 for sale

AMAT / APPLIED MATERIALS P5000 Reactor is a state-of-the-art reactor that is designed for a wide array of applications in the semiconductor manufacturing arena. It is a horizontal thermal process reactor which allows for large-scale diffusion doping, oxidation and annealing processes. The reactor has a 40x40x60 process zone with a full range of gas processing capabilities. This reactor has been engineered to deliver low temperature, high uniformity and low gas consumption. The reactor has a comprehensive throughput, which makes it highly suitable for mass production applications. It has a broad range of processing parameters with a process temperature range of 100 to 1100 degrees Celsius. This ensures that it is capable of handling a variety of complex semiconductor materials. The Adaptive Dynamic Process Control (ADPC) system of the reactor facilitates a self-optimizing operating mode that can deliver uniformity and consistent quality over a broad range of recipes and process conditions. The reactor's chamber is designed to be highly efficient, requiring minimal gas usage while delivering low contamination levels. This is achieved by combining a 'box' reactor geometry with a continuous gas flow throughout the processing volume. The chamber also features a patented back purge design which is specifically intended to minimize outgassing. AMAT P-5000 also features a high level of build flexibility, allowing it to be used in both single-chamber and multi-chamber configurations. This is possible thanks to the flexibility of its modular design with easily interchangeable components. Additionally, APPLIED MATERIALS P 5000 features a customizable gas box door design which allows it to fit into various existing installations. Finally, APPLIED MATERIALS P5000 reactor is designed with an industry standard monitoring system, allowing for operators to monitor and adjust the process parameters in order to maintain optimal performance. The reactor's built-in control system allows for easy automated tuning of the process conditions for improved yields. Thus, P-5000 reactor is an ideal choice for a wide range of semiconductor manufacturing processes.