Used AMAT / APPLIED MATERIALS P5000 #9396227 for sale

AMAT / APPLIED MATERIALS P5000 is a type of semiconductor-focused PVD (Physical Vapor Deposition) reactor. It is designed for semiconductor processing including sputtering and source deposition. This type of reactor is a vacuum chamber that is used to deposit thin films of material onto substrates. The system consists of a process chamber, a high-vacuum pump, a heating element, and a control computer. The process chamber of AMAT P-5000 is a cylindrical metallic structure coated with insulation material. It has an inner diameter of 250mm and is equipped with a process coil magnet that is used to ionize the sputtered material and improve adhesion of the deposited films. The process chamber is heated using ceramic heating elements and can reach temperatures of up to 1000°C. The high-vacuum pump allows the chamber to be evacuated to pressures of 0.1 torr or less. Once the chamber is evacuated, an inert gas, such as argon, is used to create a clean and stable environment within the chamber in order to ensure that the films are deposited onto the substrate in a uniform fashion. The process gas, typically oxygen, is also introduced into the chamber to aid in removing carbon contamination and to improve the uniformity of the films. The control computer is responsible for controlling the process parameters and monitoring the entire system. It allows for precise control over parameters such as process power, chamber pressure, temperature, and gas flow rate. This allows users to achieve precise control over desired films, including films that are targeted to very specific specifications. APPLIED MATERIALS P 5000 is an efficient, high-performance reactor. It is capable of achieving high deposition rates with excellent step coverage and uniformity. With its precise process control and clean operating environment, it is an ideal choice for a variety of sputtering and source deposition applications.