Used AMAT / APPLIED MATERIALS P5000 #9397173 for sale

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ID: 9397173
Vintage: 2001
CVD System, 8" Gases: SiH4, N2, Ar, O2 2001 vintage.
AMAT / APPLIED MATERIALS P5000 is a high-end semiconductor reactor used in the production of integrated circuits and other complex components. AMAT P-5000 is a batch-mode plasma etch and deposition equipment based on thermal chemical reaction. It uses a relatively high-level process pressure and a strong inductive plasma generator to maintain a stable process. This makes the system highly efficient and reliable. The substrate size of APPLIED MATERIALS P 5000 can range from 1 cm to 12 cm and it is also capable of handling ultra-large substrates up to 24 cm. P5000 is able to maintain a uniform and consistent process all throughout the substrate, ensuring a high level of quality for all your components. AMAT / APPLIED MATERIALS P-5000 is also equipped with various features to enhance its performance and give users an edge when it comes to precision and quality. It is equipped with an advanced cathode centerline, a multi-point attitude control unit and a sophisticated monitoring solution. AMAT P5000 features AutoGrid™ technology, which automatically configures the grids to ensure optimum etch uniformity for all your components. The patented AutoGrid™ technology eliminates operator errors due to manual configuration, thus reducing downtime and increasing productivity. In addition, APPLIED MATERIALS P5000 also comes with an intelligent process controller, an auto-tune algorithm that adjusts process parameters to match any machine change or operator's preferences, and a wafer-thickness control tool that regulates the gas pressure and other process parameters. P 5000 is an advanced and highly reliable etch and deposition asset. It provides a consistent, uniform process, due to its state-of-the-art features, such as the AutoGrid™ technology and the intelligent process controller. This makes it an excellent choice for all types of complex components.
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