Used AMAT / APPLIED MATERIALS P5000 #9400331 for sale

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ID: 9400331
Vintage: 1990
CVD System 1990 vintage.
AMAT / APPLIED MATERIALS P5000 reactor is a type of ion implantation equipment designed to implant dopant ions into substrates or other materials. This process is used to modify the electrical behavior of a semiconductor material, primarily silicon. AMAT P-5000 is a split-type reactor, with an encapsulated ion source and accelerating equipment located in a separate enclosure. This configuration allows the implant chamber, which contains the substrate, to be mounted and operated in an inert gas environment. APPLIED MATERIALS P 5000 reactor has multiple sources, allowing it to implicate different ions into the substrate. In a typical configuration, an axial vacuum ion gun is used to implant boron, arsenic, or phosphorous ions into the substrate, with an end-mounted planar ion gun used to implant gallium ions. The maximum implant energy of the device is 1000keV, with a beam current of 200μA. In addition, the dose accuracy of P 5000 is about 1% with a wide range of adjustment. APPLIED MATERIALS P5000 is equipped with an automated height-adjusting substrate stage, allowing the substrate to be raised or lowered prior to implantation. Additionally, the height and tilt of the substrate stage can be controlled precisely, and the device includes an advanced beam heating system to reduce the risk of implantation instability. AMAT / APPLIED MATERIALS P-5000 includes a number of safety features to ensure that the equipment is operated safely and securely. These include a fail-safe shutter unit that closes when the pressure in the implant chamber exceeds a certain limit, as well as pressure and temperature alarms. Furthermore, all implantation parameters are automatically monitored and logged during the implantation process, allowing the reactor to be operated remotely. Overall, AMAT P 5000 is a powerful, versatile, and safe ion implantation reactor that can be used to modify the electrical properties of semiconductor materials. Its various safety features, such as the fail-safe shutter machine and automated monitoring, ensure that it is operated securely and reliably. Furthermore, its adjustable substrate stage and beam heating tool further enhance its functionality and performance.
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